Abstract
We demonstrate the highest spatial resolution reported in scanning transmission x-ray microscopy to date. For the first time in x-ray microscopy, features below 10 nm in width were resolved in the soft x-ray regime (1.2 keV) and 20-nm lines and spaces were visible at multi-keV photon energies (6.2 keV). These achievements were accomplished using zone-doubled Fresnel zone plates. These lenses were fabricated by combining electron-beam lithography and atomic layer deposition of iridium. Diffraction efficiencies up to 8% were measured for zone-doubled Fresnel zone plates with an outermost zone width of 25 nm at 6.2-keV photon energy.
Original language | English |
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Title of host publication | 10th International Conference on X-Ray Microscopy |
Pages | 192-195 |
Number of pages | 4 |
Volume | 1365 |
DOIs | |
Publication status | Published - 1 Dec 2010 |
Externally published | Yes |
Event | 10th International Conference on X-Ray Microscopy - Chicago, United States of America Duration: 15 Aug 2010 → 20 Aug 2010 |
Conference
Conference | 10th International Conference on X-Ray Microscopy |
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Country | United States of America |
City | Chicago |
Period | 15/08/10 → 20/08/10 |
Keywords
- atomic layer deposition
- electron beam lithography
- x-ray diffractive optics
- X-ray microscopy