X-ray lithography patterning of magnetic materials and their characterization

Patrizio Candeloro, R Kumar, Luca Businaro, Enzo Di Fabrizio, Massimo Conti, Matteo Altissimo, Gianluca Gubbiotti, Giovani Carlotti, Annamaria Gerardino, Roberto Zivieri, Onofrio Donzelli

Research output: Contribution to journalArticleResearchpeer-review

5 Citations (Scopus)

Abstract

Magnetic arrays of rectangular dots 1100 nm??300 nm with 200 nm spacing (pattern a) and dots 800 nm??550 nm with 200 nm spacing (pattern b) with the nominal thickness of 30 nm in Permalloy (Ni81Fe19) material were fabricated using X-ray lithography in combination of lift-off technique. A detailed magnetic characterization of the dot arrays was accomplished by magneto-optical Kerr effect investigations and micro-magnetic simulations, with emphasis given to the dependence of the hysteresis loop of the dots on their aspect ratio (shape anisotropy). In addition, the high frequency dynamical properties were probed by Brillouin light scattering (BLS) showing a marked discretization of the Damon-Eshbach surface spin-wave mode induced by the finite lateral dimensions. The measured frequencies compare fairly well to those calculated by an analytical method which considers spin waves confined in rectangular prisms.
Original languageEnglish
Pages (from-to)3802 - 3806
Number of pages5
JournalJapanese Journal of Applied Physics
Volume42
DOIs
Publication statusPublished - 2003

Cite this

Candeloro, P., Kumar, R., Businaro, L., Di Fabrizio, E., Conti, M., Altissimo, M., ... Donzelli, O. (2003). X-ray lithography patterning of magnetic materials and their characterization. Japanese Journal of Applied Physics, 42, 3802 - 3806. https://doi.org/10.1143/JJAP.42.3802
Candeloro, Patrizio ; Kumar, R ; Businaro, Luca ; Di Fabrizio, Enzo ; Conti, Massimo ; Altissimo, Matteo ; Gubbiotti, Gianluca ; Carlotti, Giovani ; Gerardino, Annamaria ; Zivieri, Roberto ; Donzelli, Onofrio. / X-ray lithography patterning of magnetic materials and their characterization. In: Japanese Journal of Applied Physics. 2003 ; Vol. 42. pp. 3802 - 3806.
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title = "X-ray lithography patterning of magnetic materials and their characterization",
abstract = "Magnetic arrays of rectangular dots 1100 nm??300 nm with 200 nm spacing (pattern a) and dots 800 nm??550 nm with 200 nm spacing (pattern b) with the nominal thickness of 30 nm in Permalloy (Ni81Fe19) material were fabricated using X-ray lithography in combination of lift-off technique. A detailed magnetic characterization of the dot arrays was accomplished by magneto-optical Kerr effect investigations and micro-magnetic simulations, with emphasis given to the dependence of the hysteresis loop of the dots on their aspect ratio (shape anisotropy). In addition, the high frequency dynamical properties were probed by Brillouin light scattering (BLS) showing a marked discretization of the Damon-Eshbach surface spin-wave mode induced by the finite lateral dimensions. The measured frequencies compare fairly well to those calculated by an analytical method which considers spin waves confined in rectangular prisms.",
author = "Patrizio Candeloro and R Kumar and Luca Businaro and {Di Fabrizio}, Enzo and Massimo Conti and Matteo Altissimo and Gianluca Gubbiotti and Giovani Carlotti and Annamaria Gerardino and Roberto Zivieri and Onofrio Donzelli",
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Candeloro, P, Kumar, R, Businaro, L, Di Fabrizio, E, Conti, M, Altissimo, M, Gubbiotti, G, Carlotti, G, Gerardino, A, Zivieri, R & Donzelli, O 2003, 'X-ray lithography patterning of magnetic materials and their characterization', Japanese Journal of Applied Physics, vol. 42, pp. 3802 - 3806. https://doi.org/10.1143/JJAP.42.3802

X-ray lithography patterning of magnetic materials and their characterization. / Candeloro, Patrizio; Kumar, R; Businaro, Luca; Di Fabrizio, Enzo; Conti, Massimo; Altissimo, Matteo; Gubbiotti, Gianluca; Carlotti, Giovani; Gerardino, Annamaria; Zivieri, Roberto; Donzelli, Onofrio.

In: Japanese Journal of Applied Physics, Vol. 42, 2003, p. 3802 - 3806.

Research output: Contribution to journalArticleResearchpeer-review

TY - JOUR

T1 - X-ray lithography patterning of magnetic materials and their characterization

AU - Candeloro, Patrizio

AU - Kumar, R

AU - Businaro, Luca

AU - Di Fabrizio, Enzo

AU - Conti, Massimo

AU - Altissimo, Matteo

AU - Gubbiotti, Gianluca

AU - Carlotti, Giovani

AU - Gerardino, Annamaria

AU - Zivieri, Roberto

AU - Donzelli, Onofrio

PY - 2003

Y1 - 2003

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AB - Magnetic arrays of rectangular dots 1100 nm??300 nm with 200 nm spacing (pattern a) and dots 800 nm??550 nm with 200 nm spacing (pattern b) with the nominal thickness of 30 nm in Permalloy (Ni81Fe19) material were fabricated using X-ray lithography in combination of lift-off technique. A detailed magnetic characterization of the dot arrays was accomplished by magneto-optical Kerr effect investigations and micro-magnetic simulations, with emphasis given to the dependence of the hysteresis loop of the dots on their aspect ratio (shape anisotropy). In addition, the high frequency dynamical properties were probed by Brillouin light scattering (BLS) showing a marked discretization of the Damon-Eshbach surface spin-wave mode induced by the finite lateral dimensions. The measured frequencies compare fairly well to those calculated by an analytical method which considers spin waves confined in rectangular prisms.

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Candeloro P, Kumar R, Businaro L, Di Fabrizio E, Conti M, Altissimo M et al. X-ray lithography patterning of magnetic materials and their characterization. Japanese Journal of Applied Physics. 2003;42:3802 - 3806. https://doi.org/10.1143/JJAP.42.3802