TY - JOUR
T1 - X-ray lithography for micro- and nano-fabrication at ELETTRA for interdisciplinary applications
AU - Di Fabrizio, Enzo
AU - Fillipo, R
AU - Cabrini, Stefano
AU - Kumar, R
AU - Perennes, Frederic
AU - Altissimo, Matteo
AU - Businaro, Luca
AU - Cojac, D
AU - Vaccari, Lisa
AU - Prasciolu, M
AU - Candeloro, P
PY - 2004
Y1 - 2004
N2 - ELETTRA (http://www.elettra.trieste.it/index.html) is a third generation synchrotron radiation source facility operating at Trieste, Italy, and hosts a wide range of research activities in advanced materials analysis and processing, biology and nano-science at several various beam lines. The energy spectrum of ELETTRA allows x-ray nano-lithography using soft (1.5 keV) and hard x-ray (10 keV) wavelengths. The Laboratory for Interdisciplinary Lithography (LIILIT) was established in 1998 as part of an Italian national initiative on micro- and nano-technology project of INFM and is funded and supported by the Italian National Research Council (CNR), INFM and ELETTRA. LILIT had developed two dedicated lithographic beam lines for soft (1.5 keV) and hard x-ray (10 keV) for micro- and nano-fabrication activities for their applications in engineering, science and bio-medical applications. In this paper, we present a summary of our research activities in micro- and nano-fabrication involving x-ray nanolithography at LILIT s soft and hard x-ray beam lines.
AB - ELETTRA (http://www.elettra.trieste.it/index.html) is a third generation synchrotron radiation source facility operating at Trieste, Italy, and hosts a wide range of research activities in advanced materials analysis and processing, biology and nano-science at several various beam lines. The energy spectrum of ELETTRA allows x-ray nano-lithography using soft (1.5 keV) and hard x-ray (10 keV) wavelengths. The Laboratory for Interdisciplinary Lithography (LIILIT) was established in 1998 as part of an Italian national initiative on micro- and nano-technology project of INFM and is funded and supported by the Italian National Research Council (CNR), INFM and ELETTRA. LILIT had developed two dedicated lithographic beam lines for soft (1.5 keV) and hard x-ray (10 keV) for micro- and nano-fabrication activities for their applications in engineering, science and bio-medical applications. In this paper, we present a summary of our research activities in micro- and nano-fabrication involving x-ray nanolithography at LILIT s soft and hard x-ray beam lines.
UR - https://www.scopus.com/pages/publications/4444247580
U2 - 10.1088/0953-8984/16/33/013
DO - 10.1088/0953-8984/16/33/013
M3 - Article
SN - 0953-8984
VL - 16
SP - 3517
EP - 3534
JO - Journal of Physics: Condensed Matter
JF - Journal of Physics: Condensed Matter
IS - 33
ER -