Abstract
Hydroxyapatite-like thin films on silicon substrate were deposited using atomic layer deposition and were subjected to irradiation with Ar ions accelerated through 0.6-1.2 kV as well as 2 MeV 16O+ ions. After low energy Ar irradiation a significant reduction in contact angle was observed. However, the Ca/P atomic ratio remained unchanged. No reduction in contact angle was seen for high energy 16O+ irradiation. Atomic force microscopy showed the enhancement of floral-like pattern after low energy Ar bombardment while high energy oxygen irradiation lead to raised islands on as-deposited films.
| Original language | English |
|---|---|
| Pages (from-to) | 2515-2519 |
| Number of pages | 5 |
| Journal | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
| Volume | 266 |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - 1 May 2008 |
| Externally published | Yes |
Keywords
- AFM
- Hydroxyapatite
- Irradiation
- Osteoblast
- RBS
- Wettability