Virtual scattering of high-energy electrons by Plasmons and Valence electrons in silicon

Adam J Forsyth, Andrew E Smith, T W Josefsson

Research output: Contribution to journal › Article › Other

Original language	English
Pages (from-to)	523 - 525
Number of pages	3
Journal	Acta Crystallographica Section A: Foundations of Crystallography
Publication status	Published - 1997

Cite this

@article{2cdac2e6c1284c8bb843a0da80481e8b,

title = "Virtual scattering of high-energy electrons by Plasmons and Valence electrons in silicon",

author = "Forsyth, {Adam J} and Smith, {Andrew E} and Josefsson, {T W}",

year = "1997",

language = "English",

pages = "523 -- 525",

journal = "Acta Crystallographica Section A: Foundations and Advances",

issn = "2053-2733",

publisher = "International Union of Crystallography (IUCr)",

}