Valence band engineering by a layer insertion to sillén-aurivillius perovskite oxyhalides

Daichi Kato; Cécile Herve; Takafumi Yamamoto; Hironobu Kunioku; Masanobu Higashi; Ryu Abe; Hiroshi Kageyama

doi:10.1246/cl.170301

Valence band engineering by a layer insertion to sillén-aurivillius perovskite oxyhalides

Daichi Kato, Cécile Herve, Takafumi Yamamoto, Hironobu Kunioku, Masanobu Higashi, Ryu Abe, Hiroshi Kageyama

Research output: Contribution to journal › Article › Research › peer-review

5 Citations (Scopus)

Abstract

We investigated the structural and optical properties of (A_0.6X)Bi₄(Nb_0.6W_0.4)O₈X (A = K, Rb, Cs and X = Cl, Br). We found that these SillénAurivillius-related oxyhalides have band gaps of ca. 3.1 eV (X = Cl) and ca. 2.8 eV (X = Br), which are surprisingly larger than 2.4 eV for the archetypal Bi₄NbO₈Cl, meaning a substantial stabilization of O-2p orbitals upon A_0.6X layer insertion. The present study suggests versatile possibilities of band gap engineering in SillénAurivillius type compounds.

Original language	English
Pages (from-to)	1083-1085
Number of pages	3
Journal	Chemistry Letters
Volume	46
Issue number	8
DOIs	https://doi.org/10.1246/cl.170301
Publication status	Published - 12 May 2017
Externally published	Yes

Keywords

Mixed-anion compounds
Photocatalyst
Sillén–Aurivillius perovskite

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10.1246/cl.170301

Cite this

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title = "Valence band engineering by a layer insertion to sill{\'e}n-aurivillius perovskite oxyhalides",

abstract = "We investigated the structural and optical properties of (A0.6X)Bi4(Nb0.6W0.4)O8X (A = K, Rb, Cs and X = Cl, Br). We found that these Sill{\'e}nAurivillius-related oxyhalides have band gaps of ca. 3.1 eV (X = Cl) and ca. 2.8 eV (X = Br), which are surprisingly larger than 2.4 eV for the archetypal Bi4NbO8Cl, meaning a substantial stabilization of O-2p orbitals upon A0.6X layer insertion. The present study suggests versatile possibilities of band gap engineering in Sill{\'e}nAurivillius type compounds.",

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author = "Daichi Kato and C{\'e}cile Herve and Takafumi Yamamoto and Hironobu Kunioku and Masanobu Higashi and Ryu Abe and Hiroshi Kageyama",

year = "2017",

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doi = "10.1246/cl.170301",

language = "English",

volume = "46",

pages = "1083--1085",

journal = "Chemistry Letters",

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T1 - Valence band engineering by a layer insertion to sillén-aurivillius perovskite oxyhalides

AU - Kato, Daichi

AU - Herve, Cécile

AU - Yamamoto, Takafumi

AU - Kunioku, Hironobu

AU - Higashi, Masanobu

AU - Abe, Ryu

AU - Kageyama, Hiroshi

PY - 2017/5/12

Y1 - 2017/5/12

N2 - We investigated the structural and optical properties of (A0.6X)Bi4(Nb0.6W0.4)O8X (A = K, Rb, Cs and X = Cl, Br). We found that these SillénAurivillius-related oxyhalides have band gaps of ca. 3.1 eV (X = Cl) and ca. 2.8 eV (X = Br), which are surprisingly larger than 2.4 eV for the archetypal Bi4NbO8Cl, meaning a substantial stabilization of O-2p orbitals upon A0.6X layer insertion. The present study suggests versatile possibilities of band gap engineering in SillénAurivillius type compounds.

AB - We investigated the structural and optical properties of (A0.6X)Bi4(Nb0.6W0.4)O8X (A = K, Rb, Cs and X = Cl, Br). We found that these SillénAurivillius-related oxyhalides have band gaps of ca. 3.1 eV (X = Cl) and ca. 2.8 eV (X = Br), which are surprisingly larger than 2.4 eV for the archetypal Bi4NbO8Cl, meaning a substantial stabilization of O-2p orbitals upon A0.6X layer insertion. The present study suggests versatile possibilities of band gap engineering in SillénAurivillius type compounds.

KW - Mixed-anion compounds

KW - Photocatalyst

KW - Sillén–Aurivillius perovskite

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U2 - 10.1246/cl.170301

DO - 10.1246/cl.170301

M3 - Article

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EP - 1085

JO - Chemistry Letters

JF - Chemistry Letters

SN - 0366-7022

IS - 8

ER -

Valence band engineering by a layer insertion to sillén-aurivillius perovskite oxyhalides

Abstract

Keywords

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