Valence band engineering by a layer insertion to sillén-aurivillius perovskite oxyhalides

Daichi Kato, Cécile Herve, Takafumi Yamamoto, Hironobu Kunioku, Masanobu Higashi, Ryu Abe, Hiroshi Kageyama

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1 Citation (Scopus)

Abstract

We investigated the structural and optical properties of (A0.6X)Bi4(Nb0.6W0.4)O8X (A = K, Rb, Cs and X = Cl, Br). We found that these SillénAurivillius-related oxyhalides have band gaps of ca. 3.1 eV (X = Cl) and ca. 2.8 eV (X = Br), which are surprisingly larger than 2.4 eV for the archetypal Bi4NbO8Cl, meaning a substantial stabilization of O-2p orbitals upon A0.6X layer insertion. The present study suggests versatile possibilities of band gap engineering in SillénAurivillius type compounds.

Original languageEnglish
Pages (from-to)1083-1085
Number of pages3
JournalChemistry Letters
Volume46
Issue number8
DOIs
Publication statusPublished - 12 May 2017
Externally publishedYes

Keywords

  • Mixed-anion compounds
  • Photocatalyst
  • Sillén–Aurivillius perovskite

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