Two-photon polymerization lithography for imaging optics

Hao Wang, Cheng Feng Pan, Chi Li, Kishan S. Menghrajani, Markus A. Schmidt, Aoling Li, Fu Fan, Yu Zhou, Wang Zhang, Hongtao Wang, Parvathi Nair Suseela Nair, John You En Chan, Tomohiro Mori, Yueqiang Hu, Guangwei Hu, Stefan A. Maier, Haoran Ren, Huigao Duan, Joel K.W. Yang

Research output: Contribution to journalReview ArticleResearchpeer-review

1 Citation (Scopus)


Highlights Provide a comprehensive overview of two-photon polymerization lithography (TPL)-based imaging applications. Introduce the fundamental imaging theories, key materials properties, and fabrication technologies. Classify and summarize the various imaging applications of TPL. Envisage the future trends of TPL for imaging optics and offer insights on the potential solutions to current challenges.

Original languageEnglish
Article number042002
Number of pages40
JournalInternational Journal of Extreme Manufacturing
Issue number4
Publication statusPublished - Aug 2024


  • 3D printing
  • additive manufacturing
  • imaging
  • optics and nanophotonics
  • two-photon polymerization lithography

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