Two-photon polymerization lithography for imaging optics

Hao Wang; Cheng Feng Pan; Chi Li; Kishan S. Menghrajani; Markus A. Schmidt; Aoling Li; Fu Fan; Yu Zhou; Wang Zhang; Hongtao Wang; Parvathi Nair Suseela Nair; John You En Chan; Tomohiro Mori; Yueqiang Hu; Guangwei Hu; Stefan A. Maier; Haoran Ren; Huigao Duan; Joel K.W. Yang

doi:10.1088/2631-7990/ad35fe

Two-photon polymerization lithography for imaging optics

Hao Wang, Cheng Feng Pan, Chi Li, Kishan S. Menghrajani, Markus A. Schmidt, Aoling Li, Fu Fan, Yu Zhou, Wang Zhang, Hongtao Wang, Parvathi Nair Suseela Nair, John You En Chan, Tomohiro Mori, Yueqiang Hu, Guangwei Hu, Stefan A. Maier, Haoran Ren, Huigao Duan, Joel K.W. Yang

School of Physics and Astronomy

Research output: Contribution to journal › Review Article › Research › peer-review

29 Citations (Scopus)

Abstract

Highlights Provide a comprehensive overview of two-photon polymerization lithography (TPL)-based imaging applications. Introduce the fundamental imaging theories, key materials properties, and fabrication technologies. Classify and summarize the various imaging applications of TPL. Envisage the future trends of TPL for imaging optics and offer insights on the potential solutions to current challenges.

Original language	English
Article number	042002
Number of pages	40
Journal	International Journal of Extreme Manufacturing
Volume	6
Issue number	4
DOIs	https://doi.org/10.1088/2631-7990/ad35fe
Publication status	Published - Aug 2024

Keywords

3D printing
additive manufacturing
imaging
optics and nanophotonics
two-photon polymerization lithography

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10.1088/2631-7990/ad35feLicence: CC BY

Cite this

Wang, H., Pan, C. F., Li, C., Menghrajani, K. S., Schmidt, M. A., Li, A., Fan, F., Zhou, Y., Zhang, W., Wang, H., Nair, P. N. S., Chan, J. Y. E., Mori, T., Hu, Y., Hu, G., Maier, S. A., Ren, H., Duan, H., & Yang, J. K. W. (2024). Two-photon polymerization lithography for imaging optics. International Journal of Extreme Manufacturing, 6(4), Article 042002. https://doi.org/10.1088/2631-7990/ad35fe

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title = "Two-photon polymerization lithography for imaging optics",

abstract = "Highlights Provide a comprehensive overview of two-photon polymerization lithography (TPL)-based imaging applications. Introduce the fundamental imaging theories, key materials properties, and fabrication technologies. Classify and summarize the various imaging applications of TPL. Envisage the future trends of TPL for imaging optics and offer insights on the potential solutions to current challenges.",

keywords = "3D printing, additive manufacturing, imaging, optics and nanophotonics, two-photon polymerization lithography",

author = "Hao Wang and Pan, {Cheng Feng} and Chi Li and Menghrajani, {Kishan S.} and Schmidt, {Markus A.} and Aoling Li and Fu Fan and Yu Zhou and Wang Zhang and Hongtao Wang and Nair, {Parvathi Nair Suseela} and Chan, {John You En} and Tomohiro Mori and Yueqiang Hu and Guangwei Hu and Maier, {Stefan A.} and Haoran Ren and Huigao Duan and Yang, {Joel K.W.}",

note = "Publisher Copyright: {\textcopyright} 2024 The Author(s). Published by IOP Publishing Ltd on behalf of the IMMT.",

year = "2024",

month = aug,

doi = "10.1088/2631-7990/ad35fe",

language = "English",

volume = "6",

journal = "International Journal of Extreme Manufacturing",

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AU - Wang, Hao

AU - Pan, Cheng Feng

AU - Li, Chi

AU - Menghrajani, Kishan S.

AU - Schmidt, Markus A.

AU - Li, Aoling

AU - Fan, Fu

AU - Zhou, Yu

AU - Zhang, Wang

AU - Wang, Hongtao

AU - Nair, Parvathi Nair Suseela

AU - Chan, John You En

AU - Mori, Tomohiro

AU - Hu, Yueqiang

AU - Hu, Guangwei

AU - Maier, Stefan A.

AU - Ren, Haoran

AU - Duan, Huigao

AU - Yang, Joel K.W.

PY - 2024/8

Y1 - 2024/8

N2 - Highlights Provide a comprehensive overview of two-photon polymerization lithography (TPL)-based imaging applications. Introduce the fundamental imaging theories, key materials properties, and fabrication technologies. Classify and summarize the various imaging applications of TPL. Envisage the future trends of TPL for imaging optics and offer insights on the potential solutions to current challenges.

AB - Highlights Provide a comprehensive overview of two-photon polymerization lithography (TPL)-based imaging applications. Introduce the fundamental imaging theories, key materials properties, and fabrication technologies. Classify and summarize the various imaging applications of TPL. Envisage the future trends of TPL for imaging optics and offer insights on the potential solutions to current challenges.

KW - 3D printing

KW - additive manufacturing

KW - imaging

KW - optics and nanophotonics

KW - two-photon polymerization lithography

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U2 - 10.1088/2631-7990/ad35fe

DO - 10.1088/2631-7990/ad35fe

M3 - Review Article

AN - SCOPUS:85190828500

SN - 2631-8644

VL - 6

JO - International Journal of Extreme Manufacturing

JF - International Journal of Extreme Manufacturing

IS - 4

M1 - 042002

ER -

Two-photon polymerization lithography for imaging optics

Abstract

Keywords

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