Tunable 2D binary colloidal alloys for soft nanotemplating

Miguel Ángel Fernández-Rodríguez, Roey Elnathan, Ran Ditcovski, Fabio Grillo, Gaurasundar Marc Conley, Flavia Timpu, Astrid Rauh, Karen Geisel, Tal Ellenbogen, Rachel Grange, Frank Scheffold, Matthias Karg, Walter Richtering, Nicolas H. Voelcker, Lucio Isa

Research output: Contribution to journalArticleResearchpeer-review

Abstract

The realization of non-close-packed nanoscale patterns with multiple feature sizes and length scales via colloidal self-assembly is a highly challenging task. We demonstrate here the creation of a variety of tunable particle arrays by harnessing the sequential self-assembly and deposition of two differently sized microgel particles at the fluid-fluid interface. The two-step process is essential to achieve a library of 2D binary colloidal alloys, which are kinetically inaccessible by direct co-assembly. These versatile binary patterns can be exploited for a range of end-uses. Here we show that they can for instance be transferred to silicon substrates, where they act as masks for the metal-assisted chemical etching of binary arrays of vertically aligned silicon nanowires (VA-SiNWs) with fine geometrical control. In particular, continuous binary gradients in both NW spacing and height can be achieved. Notably, these binary VA-SiNW platforms exhibit interesting anti-reflective properties in the visible range, in agreement with simulations. The proposed strategy can also be used for the precise placement of metallic nanoparticles in non-close-packed arrays. Sequential depositions of soft particles enable therefore the exploration of complex binary patterns, e.g. for the future development of substrates for biointerfaces, catalysis and controlled wetting.

Original languageEnglish
Pages (from-to)22189-22195
Number of pages7
JournalNanoscale
Volume10
Issue number47
DOIs
Publication statusPublished - 21 Dec 2018

Cite this

Fernández-Rodríguez, M. Á., Elnathan, R., Ditcovski, R., Grillo, F., Conley, G. M., Timpu, F., ... Isa, L. (2018). Tunable 2D binary colloidal alloys for soft nanotemplating. Nanoscale, 10(47), 22189-22195. https://doi.org/10.1039/c8nr07059h
Fernández-Rodríguez, Miguel Ángel ; Elnathan, Roey ; Ditcovski, Ran ; Grillo, Fabio ; Conley, Gaurasundar Marc ; Timpu, Flavia ; Rauh, Astrid ; Geisel, Karen ; Ellenbogen, Tal ; Grange, Rachel ; Scheffold, Frank ; Karg, Matthias ; Richtering, Walter ; Voelcker, Nicolas H. ; Isa, Lucio. / Tunable 2D binary colloidal alloys for soft nanotemplating. In: Nanoscale. 2018 ; Vol. 10, No. 47. pp. 22189-22195.
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Fernández-Rodríguez, MÁ, Elnathan, R, Ditcovski, R, Grillo, F, Conley, GM, Timpu, F, Rauh, A, Geisel, K, Ellenbogen, T, Grange, R, Scheffold, F, Karg, M, Richtering, W, Voelcker, NH & Isa, L 2018, 'Tunable 2D binary colloidal alloys for soft nanotemplating' Nanoscale, vol. 10, no. 47, pp. 22189-22195. https://doi.org/10.1039/c8nr07059h

Tunable 2D binary colloidal alloys for soft nanotemplating. / Fernández-Rodríguez, Miguel Ángel; Elnathan, Roey; Ditcovski, Ran; Grillo, Fabio; Conley, Gaurasundar Marc; Timpu, Flavia; Rauh, Astrid; Geisel, Karen; Ellenbogen, Tal; Grange, Rachel; Scheffold, Frank; Karg, Matthias; Richtering, Walter; Voelcker, Nicolas H.; Isa, Lucio.

In: Nanoscale, Vol. 10, No. 47, 21.12.2018, p. 22189-22195.

Research output: Contribution to journalArticleResearchpeer-review

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AU - Fernández-Rodríguez, Miguel Ángel

AU - Elnathan, Roey

AU - Ditcovski, Ran

AU - Grillo, Fabio

AU - Conley, Gaurasundar Marc

AU - Timpu, Flavia

AU - Rauh, Astrid

AU - Geisel, Karen

AU - Ellenbogen, Tal

AU - Grange, Rachel

AU - Scheffold, Frank

AU - Karg, Matthias

AU - Richtering, Walter

AU - Voelcker, Nicolas H.

AU - Isa, Lucio

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N2 - The realization of non-close-packed nanoscale patterns with multiple feature sizes and length scales via colloidal self-assembly is a highly challenging task. We demonstrate here the creation of a variety of tunable particle arrays by harnessing the sequential self-assembly and deposition of two differently sized microgel particles at the fluid-fluid interface. The two-step process is essential to achieve a library of 2D binary colloidal alloys, which are kinetically inaccessible by direct co-assembly. These versatile binary patterns can be exploited for a range of end-uses. Here we show that they can for instance be transferred to silicon substrates, where they act as masks for the metal-assisted chemical etching of binary arrays of vertically aligned silicon nanowires (VA-SiNWs) with fine geometrical control. In particular, continuous binary gradients in both NW spacing and height can be achieved. Notably, these binary VA-SiNW platforms exhibit interesting anti-reflective properties in the visible range, in agreement with simulations. The proposed strategy can also be used for the precise placement of metallic nanoparticles in non-close-packed arrays. Sequential depositions of soft particles enable therefore the exploration of complex binary patterns, e.g. for the future development of substrates for biointerfaces, catalysis and controlled wetting.

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Fernández-Rodríguez MÁ, Elnathan R, Ditcovski R, Grillo F, Conley GM, Timpu F et al. Tunable 2D binary colloidal alloys for soft nanotemplating. Nanoscale. 2018 Dec 21;10(47):22189-22195. https://doi.org/10.1039/c8nr07059h