Abstract
The realization of non-close-packed nanoscale patterns with multiple feature sizes and length scales via colloidal self-assembly is a highly challenging task. We demonstrate here the creation of a variety of tunable particle arrays by harnessing the sequential self-assembly and deposition of two differently sized microgel particles at the fluid-fluid interface. The two-step process is essential to achieve a library of 2D binary colloidal alloys, which are kinetically inaccessible by direct co-assembly. These versatile binary patterns can be exploited for a range of end-uses. Here we show that they can for instance be transferred to silicon substrates, where they act as masks for the metal-assisted chemical etching of binary arrays of vertically aligned silicon nanowires (VA-SiNWs) with fine geometrical control. In particular, continuous binary gradients in both NW spacing and height can be achieved. Notably, these binary VA-SiNW platforms exhibit interesting anti-reflective properties in the visible range, in agreement with simulations. The proposed strategy can also be used for the precise placement of metallic nanoparticles in non-close-packed arrays. Sequential depositions of soft particles enable therefore the exploration of complex binary patterns, e.g. for the future development of substrates for biointerfaces, catalysis and controlled wetting.
| Original language | English |
|---|---|
| Pages (from-to) | 22189-22195 |
| Number of pages | 7 |
| Journal | Nanoscale |
| Volume | 10 |
| Issue number | 47 |
| DOIs | |
| Publication status | Published - 21 Dec 2018 |
Cite this
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Tunable 2D binary colloidal alloys for soft nanotemplating. / Fernández-Rodríguez, Miguel Ángel; Elnathan, Roey; Ditcovski, Ran; Grillo, Fabio; Conley, Gaurasundar Marc; Timpu, Flavia; Rauh, Astrid; Geisel, Karen; Ellenbogen, Tal; Grange, Rachel; Scheffold, Frank; Karg, Matthias; Richtering, Walter; Voelcker, Nicolas H.; Isa, Lucio.
In: Nanoscale, Vol. 10, No. 47, 21.12.2018, p. 22189-22195.Research output: Contribution to journal › Article › Research › peer-review
TY - JOUR
T1 - Tunable 2D binary colloidal alloys for soft nanotemplating
AU - Fernández-Rodríguez, Miguel Ángel
AU - Elnathan, Roey
AU - Ditcovski, Ran
AU - Grillo, Fabio
AU - Conley, Gaurasundar Marc
AU - Timpu, Flavia
AU - Rauh, Astrid
AU - Geisel, Karen
AU - Ellenbogen, Tal
AU - Grange, Rachel
AU - Scheffold, Frank
AU - Karg, Matthias
AU - Richtering, Walter
AU - Voelcker, Nicolas H.
AU - Isa, Lucio
PY - 2018/12/21
Y1 - 2018/12/21
N2 - The realization of non-close-packed nanoscale patterns with multiple feature sizes and length scales via colloidal self-assembly is a highly challenging task. We demonstrate here the creation of a variety of tunable particle arrays by harnessing the sequential self-assembly and deposition of two differently sized microgel particles at the fluid-fluid interface. The two-step process is essential to achieve a library of 2D binary colloidal alloys, which are kinetically inaccessible by direct co-assembly. These versatile binary patterns can be exploited for a range of end-uses. Here we show that they can for instance be transferred to silicon substrates, where they act as masks for the metal-assisted chemical etching of binary arrays of vertically aligned silicon nanowires (VA-SiNWs) with fine geometrical control. In particular, continuous binary gradients in both NW spacing and height can be achieved. Notably, these binary VA-SiNW platforms exhibit interesting anti-reflective properties in the visible range, in agreement with simulations. The proposed strategy can also be used for the precise placement of metallic nanoparticles in non-close-packed arrays. Sequential depositions of soft particles enable therefore the exploration of complex binary patterns, e.g. for the future development of substrates for biointerfaces, catalysis and controlled wetting.
AB - The realization of non-close-packed nanoscale patterns with multiple feature sizes and length scales via colloidal self-assembly is a highly challenging task. We demonstrate here the creation of a variety of tunable particle arrays by harnessing the sequential self-assembly and deposition of two differently sized microgel particles at the fluid-fluid interface. The two-step process is essential to achieve a library of 2D binary colloidal alloys, which are kinetically inaccessible by direct co-assembly. These versatile binary patterns can be exploited for a range of end-uses. Here we show that they can for instance be transferred to silicon substrates, where they act as masks for the metal-assisted chemical etching of binary arrays of vertically aligned silicon nanowires (VA-SiNWs) with fine geometrical control. In particular, continuous binary gradients in both NW spacing and height can be achieved. Notably, these binary VA-SiNW platforms exhibit interesting anti-reflective properties in the visible range, in agreement with simulations. The proposed strategy can also be used for the precise placement of metallic nanoparticles in non-close-packed arrays. Sequential depositions of soft particles enable therefore the exploration of complex binary patterns, e.g. for the future development of substrates for biointerfaces, catalysis and controlled wetting.
UR - http://www.scopus.com/inward/record.url?scp=85058378340&partnerID=8YFLogxK
U2 - 10.1039/c8nr07059h
DO - 10.1039/c8nr07059h
M3 - Article
VL - 10
SP - 22189
EP - 22195
JO - Nanoscale
JF - Nanoscale
SN - 2040-3364
IS - 47
ER -