Three-dimensional micro- and nanostructuring by combination of nanoimprint and x-ray lithography

Massimo Tormen; Filippo Romanato; Matteo Altissimo; Luca Businaro; Patrizio Candeloro; Enzo Di Fabrizio

doi:10.1116/1.1688356

Three-dimensional micro- and nanostructuring by combination of nanoimprint and x-ray lithography

Massimo Tormen, Filippo Romanato, Matteo Altissimo, Luca Businaro, Patrizio Candeloro, Enzo Di Fabrizio

Melbourne Centre for Nanofabrication

Research output: Contribution to journal › Article › Research › peer-review

8 Citations (Scopus)

Abstract

We present results on a lithographic approach that combines nanoimprint (NIL) and x-ray lithography (XRL) for fabricating unconventional three-dimensional (3D) polymer structures. The use of XRL for structuring a prepatterned resist by NIL gives rise to high-resolution high-aspect-ratio structures whose overall profile is enveloped by the original 3D imprinted profile. The technological potential of this method has been demonstrated by patterning several different types of structures with XRL on an hexagonal array of hemispheres previously obtained by nanoimprinting

Original language	English
Pages (from-to)	766 - 770
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	22
Issue number	2
DOIs	https://doi.org/10.1116/1.1688356
Publication status	Published - 2004

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10.1116/1.1688356

Cite this

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title = "Three-dimensional micro- and nanostructuring by combination of nanoimprint and x-ray lithography",

abstract = "We present results on a lithographic approach that combines nanoimprint (NIL) and x-ray lithography (XRL) for fabricating unconventional three-dimensional (3D) polymer structures. The use of XRL for structuring a prepatterned resist by NIL gives rise to high-resolution high-aspect-ratio structures whose overall profile is enveloped by the original 3D imprinted profile. The technological potential of this method has been demonstrated by patterning several different types of structures with XRL on an hexagonal array of hemispheres previously obtained by nanoimprinting",

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AU - Tormen, Massimo

AU - Romanato, Filippo

AU - Altissimo, Matteo

AU - Businaro, Luca

AU - Candeloro, Patrizio

AU - Di Fabrizio, Enzo

PY - 2004

Y1 - 2004

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AB - We present results on a lithographic approach that combines nanoimprint (NIL) and x-ray lithography (XRL) for fabricating unconventional three-dimensional (3D) polymer structures. The use of XRL for structuring a prepatterned resist by NIL gives rise to high-resolution high-aspect-ratio structures whose overall profile is enveloped by the original 3D imprinted profile. The technological potential of this method has been demonstrated by patterning several different types of structures with XRL on an hexagonal array of hemispheres previously obtained by nanoimprinting

U2 - 10.1116/1.1688356

DO - 10.1116/1.1688356

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