Three-dimensional micro- and nanostructuring by combination of nanoimprint and x-ray lithography

Massimo Tormen, Filippo Romanato, Matteo Altissimo, Luca Businaro, Patrizio Candeloro, Enzo Di Fabrizio

Research output: Contribution to journalArticleResearchpeer-review

8 Citations (Scopus)


We present results on a lithographic approach that combines nanoimprint (NIL) and x-ray lithography (XRL) for fabricating unconventional three-dimensional (3D) polymer structures. The use of XRL for structuring a prepatterned resist by NIL gives rise to high-resolution high-aspect-ratio structures whose overall profile is enveloped by the original 3D imprinted profile. The technological potential of this method has been demonstrated by patterning several different types of structures with XRL on an hexagonal array of hemispheres previously obtained by nanoimprinting
Original languageEnglish
Pages (from-to)766 - 770
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number2
Publication statusPublished - 2004

Cite this