Abstract
The in situ thermal migration of alloying agents in an Al-Mg-Si-Li alloy is studied using surface sensitive photo-electron and electron diffraction/imaging techniques. Starting with the preparation of an almost oxide free surface (oxide thickness=0.1 nm), the relative abundance of alloying agents (Mg, Li and Si) at the surface are recorded at various stages of thermal annealing, from room temperature to melting (which is observed at 550 C). Prior to annealing, the surface abundances are below the detection limit≤1%, in agreement with their bulk concentrations of 0.423%Si, 0.322%Mg and 0.101%Li (atomic %). At elevated temperatures, all three alloying agents appear at drastically increased concentrations (13.3% Si, 19.7% Mg and 45.3% Li), but decrease again with further elevation of the annealing temperature or after melting. The temperature at which the migration occurs is species dependent, with Li migration occurring at significantly higher temperatures than Si and Mg. The mechanism of migration also appears to be species dependent with Li migration occurring all over the surface but Mg migration being restricted to grain boundaries.
Original language | English |
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Article number | 116501 |
Number of pages | 8 |
Journal | Materials Research Express |
Volume | 3 |
Issue number | 11 |
DOIs | |
Publication status | Published - 1 Nov 2016 |
Keywords
- Alloy
- Aluminium
- Photoemission spectroscopy
- Surface migration
- Thermal treatment