Micropatterns of aligned carbon nanotubes (CNTs) have been prepared by chemical vapor deposition (CVD) method, and patterned structure of aligned CNTs was controlled through patterned formation of silicon oxide (SiO2) using lithographic technology. The simultaneous growth of carbon nanotubes in different directions could be realized. The building of nanotube-based micro-pattern is useful for fabricating electrical devices.
- Graphite and related compounds
- Manipulation of surface structure and morphology