Soft x-ray photoemission studies of Hf oxidation

S. Suzer; S. Sayan; M. M. Banaszak Holl; E. Garfunkel; Z. Hussain; N. M. Hamdan

doi:10.1116/1.1525816

Soft x-ray photoemission studies of Hf oxidation

S. Suzer, S. Sayan, M. M. Banaszak Holl, E. Garfunkel, Z. Hussain, N. M. Hamdan

Research output: Contribution to journal › Article › Research › peer-review

96 Citations (Scopus)

Abstract

Charging of oxide films under x rays is an important issue that must be taken into consideration for determination of core-level binding energies as well as valence band offsets. Measurements are taken as a function of time, thickness, and annealing condition. Photoemission results show the presence of metallic Hf with the 4f_7/2 binding energy of 18.16 eV, and at least one clear suboxide peak.

Original language	English
Pages (from-to)	106-109
Number of pages	4
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	21
Issue number	1
DOIs	https://doi.org/10.1116/1.1525816
Publication status	Published - 1 Jan 2003
Externally published	Yes

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AU - Hussain, Z.

AU - Hamdan, N. M.

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AB - Charging of oxide films under x rays is an important issue that must be taken into consideration for determination of core-level binding energies as well as valence band offsets. Measurements are taken as a function of time, thickness, and annealing condition. Photoemission results show the presence of metallic Hf with the 4f7/2 binding energy of 18.16 eV, and at least one clear suboxide peak.

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Soft x-ray photoemission studies of Hf oxidation

Abstract

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