Soft x-ray photoemission studies of Hf oxidation

S. Suzer, S. Sayan, M. M. Banaszak Holl, E. Garfunkel, Z. Hussain, N. M. Hamdan

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96 Citations (Scopus)


Charging of oxide films under x rays is an important issue that must be taken into consideration for determination of core-level binding energies as well as valence band offsets. Measurements are taken as a function of time, thickness, and annealing condition. Photoemission results show the presence of metallic Hf with the 4f7/2 binding energy of 18.16 eV, and at least one clear suboxide peak.

Original languageEnglish
Pages (from-to)106-109
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number1
Publication statusPublished - 1 Jan 2003
Externally publishedYes

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