Screening, Friedel oscillations, and low-temperature conductivity in topological insulator thin films

Weizhe Edward Liu, Hong Liu, Dimitrie Culcer

Research output: Contribution to journalArticleResearchpeer-review

14 Citations (Scopus)

Abstract

In thin topological insulator (TI) films, the top and bottom surfaces are coupled by tunneling, which restores backscattering and strongly affects screening. We calculate the dielectric function in the random phase approximation obtaining a closed-form result. Unlike independent TI surfaces, the dielectric function of thin films exhibits a valley as a function of wave number q and tunneling, as well as a cusp at q=2kF, with kF the Fermi wave vector. As a result of the cusp, Friedel oscillations decay with distance r as sin(2kFr)/(2kFr)2. We determine the longitudinal conductivity σ in the first Born approximation at low temperatures where screened impurities provide the dominant scattering mechanism. At high electron densities ne, σ∝ne, while at low densities σ∝ne3/2.

Original languageEnglish
Article number195417
Number of pages7
JournalPhysical Review B
Volume89
Issue number19
DOIs
Publication statusPublished - 14 May 2014
Externally publishedYes

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