Rapid measurement of nanoparticle thickness profiles

Hadas Katz-Boon, Christopher John Rossouw, Christian Dwyer, Joanne Etheridge

Research output: Contribution to journalArticleResearchpeer-review

Abstract

A method to measure the thickness of a single-crystal nanoparticle in the direction parallel to the incident beam from annular dark field scanning transmission electron microscope (ADF-STEM) images is reported, providing a map of thickness versus position across the nanoparticle—a ‘thickness profile’ image. The method is rapid and hence suitable for surveying large numbers of nanoparticles. The method measures the intensity scattered to a characterised ADF detector and compares this to the incident beam intensity, to obtain a normalized ADF image. The normalised intensity is then converted to thickness via dynamical ADF image simulations. The method is accurate within 10% and the precision is dominated primarily by ‘shot noise’. Merits and limitations of this method are discussed. A method to calibrate the response function of the ADF detector without external equipment is also described, which is applicable to the entire range of gain and background settings.
Original languageEnglish
Pages (from-to)61 - 70
Number of pages10
JournalUltramicroscopy
Volume124
DOIs
Publication statusPublished - 2013

Cite this

Katz-Boon, Hadas ; Rossouw, Christopher John ; Dwyer, Christian ; Etheridge, Joanne. / Rapid measurement of nanoparticle thickness profiles. In: Ultramicroscopy. 2013 ; Vol. 124. pp. 61 - 70.
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Rapid measurement of nanoparticle thickness profiles. / Katz-Boon, Hadas; Rossouw, Christopher John; Dwyer, Christian; Etheridge, Joanne.

In: Ultramicroscopy, Vol. 124, 2013, p. 61 - 70.

Research output: Contribution to journalArticleResearchpeer-review

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AU - Dwyer, Christian

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AB - A method to measure the thickness of a single-crystal nanoparticle in the direction parallel to the incident beam from annular dark field scanning transmission electron microscope (ADF-STEM) images is reported, providing a map of thickness versus position across the nanoparticle—a ‘thickness profile’ image. The method is rapid and hence suitable for surveying large numbers of nanoparticles. The method measures the intensity scattered to a characterised ADF detector and compares this to the incident beam intensity, to obtain a normalized ADF image. The normalised intensity is then converted to thickness via dynamical ADF image simulations. The method is accurate within 10% and the precision is dominated primarily by ‘shot noise’. Merits and limitations of this method are discussed. A method to calibrate the response function of the ADF detector without external equipment is also described, which is applicable to the entire range of gain and background settings.

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