Rapid and simple potentiostatic deposition of copper (II) oxide thin films

Jagdeep S. Sagu, T. A. Nirmal Peiris, K. G. Upul Wijayantha

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18 Citations (Scopus)


A rapid method for the preparation of highly photoactive CuO thin films on fluorine-doped tin oxide (FTO) glass substrates is reported, based on very simple electrodeposition and post annealing steps. Electrodeposition was performed in an aqueous CuSO4 solution at - 1.5 V vs. Ag|AgCl|3 M KCl for 2 min and the subsequent post-annealing was conducted at 500 C in air for just 1 min. The electrodes were characterised by SEM, XRD and photo-electrochemical measurements. The CuO thin films exhibited an excellent photocurrent density of 2.1 mA cm- 2 at - 0.6 V vs. Ag|AgCl|3 M KCl in aqueous 1.0 M NaOH which is the highest reported value for a CuO electrode to date.

Original languageEnglish
Pages (from-to)68-71
Number of pages4
JournalElectrochemistry Communications
Publication statusPublished - 1 Jan 2014
Externally publishedYes


  • Photocathode
  • Solar energy
  • Water splitting

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