Polarimetry-based far-field method for high-resolution optical microscopy

Oscar G. Rodríguez-Herrera, David Lara, Chris Dainty

Research output: Chapter in Book/Report/Conference proceedingConference PaperResearchpeer-review

Abstract

We present a polarimetry-based far-field method for high-resolution optical microscopy. The method is based on the measurement of scattering-angle-resolved polarization state distributions across the exit pupil of a high numerical aperture objective lens and allows us to distinguish between different sub-resolution objects with no need for an active scanning. Our numerical and experimental results show that the scattering-angle-resolved polarization state distributions can be used in the characterization of particles and structures with features below or at the edge of the Rayleigh resolution limit.

Original languageEnglish
Title of host publication22nd Congress of the International Commission for Optics
Subtitle of host publicationLight for the Development of the World
PublisherSPIE
ISBN (Print)9780819485854
DOIs
Publication statusPublished - 2011
Externally publishedYes
EventCongress of the International Commission for Optics 2011 - Puebla, Mexico
Duration: 15 Aug 201119 Aug 2011
Conference number: 22nd
https://spie.org/Publications/Proceedings/Volume/8011?SSO=1 (Proceedings)

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8011
ISSN (Print)0277-786X

Conference

ConferenceCongress of the International Commission for Optics 2011
Country/TerritoryMexico
CityPuebla
Period15/08/1119/08/11
Internet address

Keywords

  • high numerical aperture optical systems
  • high-resolution optical microscopy
  • Polarimetry

Cite this