Abstract
The p-type doping of Hg-xCdxTe (x = 0.6) by tetraethyldistibine (Et4Sb2 during metalorganic chemical vapor deposition is described. The growth experiments were performed using the interdiffused multilayer process at a temperature of 280°C. The 77 K hole concentration was a function of Et4Sb2 flow rate, with an upper limit of ≈(1-2)X1016 cm-3.
| Original language | English |
|---|---|
| Pages (from-to) | 247-250 |
| Number of pages | 4 |
| Journal | Journal of Crystal Growth |
| Volume | 139 |
| Issue number | 3-4 |
| DOIs | |
| Publication status | Published - 2 May 1994 |