Optimizing Strontium Ruthenate Thin Films for Near-Infrared Plasmonic Applications

Several new plasmonic materials have recently been introduced in order to achieve better temperature stability than conventional plasmonic metals and control field localization with a choice of plasma frequencies in a wide spectral range. Here, epitaxial SrRuO 3 thin films with low surface roughness fabricated by pulsed laser deposition are studied. The influence of the oxygen deposition pressure (20-300 mTorr) on the charge carrier dynamics and optical constants of the thin films in the near-infrared spectral range is elucidated. It is demonstrated that SrRuO 3 thin films exhibit plasmonic behavior of the thin films in the near-infrared spectral range with the plasma frequency in 3.16-3.86â€...eV range and epsilon-near-zero wavelength in 1.11-1.47â€...μm range that could be controlled by the deposition conditions. The possible applications of these films range from the heat-generating nanostructures in the near-infrared spectral range, to metamaterial-based ideal absorbers and epsilon-near-zero components, where the interplay between real and imaginary parts of the permittivity in a given spectral range is needed for optimizing the spectral performance.