Optimization of the enhanced evanescent wave for near-field microscopy

Pu Chun Ke, Jakub Szajman, Xiao Song Gan, Min Gu

Research output: Chapter in Book/Report/Conference proceedingConference PaperOtherpeer-review

1 Citation (Scopus)

Abstract

Near-field microscopy usually uses an evanescent wave as an illumination source on a sample. An enhanced evanescent wave can be obtained at the surface of a multilayer thin-film coating system due to the optical tunneling effect. It can improve the illumination power by several orders of magnitude in near-field microscopy. The enhancement of an evanescent wave is related to the thickness and refractive indices of the thin film layers as well as the incident angle and wavelength of the illumination source. In this paper, optimization of these parameters is studied in detail under resonance conditions, and some experimental results also are presented.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Pages42-49
Number of pages8
Volume2984
DOIs
Publication statusPublished - 1 Dec 1997
Externally publishedYes
EventThree-Dimensional Microscopy: Image Acquisition and Processing IV - San Jose, CA, United States of America
Duration: 2 Dec 19972 Dec 1997

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
ISSN (Print)0277-786X

Conference

ConferenceThree-Dimensional Microscopy: Image Acquisition and Processing IV
CountryUnited States of America
CitySan Jose, CA
Period2/12/972/12/97

Cite this

Ke, P. C., Szajman, J., Gan, X. S., & Gu, M. (1997). Optimization of the enhanced evanescent wave for near-field microscopy. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 2984, pp. 42-49). (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.271276