TY - GEN
T1 - Nanostructured thin films as functional coatings
AU - Ainikalkannath Lazar, Manoj
AU - Tadvani, Jalil Khajehpour
AU - Tung, Wing
AU - Lopez, Lorena
AU - Daoud, Walid
PY - 2010
Y1 - 2010
N2 - Nanostructured thin films is one of the highly exploiting research areas particularly in applications such as photovoltaics, photocatalysis and sensor technologies. Highly tuned thin films, in terms of thickness, crystallinity, porosity and optical properties, can be fabricated on different substrates using the sol-gel method, chemical solution deposition (CSD), electrochemical etching, along with other conventional methods such as chemical vapour deposition (CVD) and physical vapour deposition (PVD). The above mentioned properties of these films are usually characterised using surface analysis techniques such as XRD, SEM, TEM, AFM, ellipsometry, electrochemistry, SAXS, reflectance spectroscopy, STM, XPS, SIMS, ESCA, X-ray topography and DOSY-NMR. This article presents a short review of the preparation and characterisation of thin films of nanocrystalline titanium dioxide and modified silicon as well as their application in solar cells, water treatment, water splitting, self cleaning fabrics, sensors, optoelectronic devices and lab on chip systems.
AB - Nanostructured thin films is one of the highly exploiting research areas particularly in applications such as photovoltaics, photocatalysis and sensor technologies. Highly tuned thin films, in terms of thickness, crystallinity, porosity and optical properties, can be fabricated on different substrates using the sol-gel method, chemical solution deposition (CSD), electrochemical etching, along with other conventional methods such as chemical vapour deposition (CVD) and physical vapour deposition (PVD). The above mentioned properties of these films are usually characterised using surface analysis techniques such as XRD, SEM, TEM, AFM, ellipsometry, electrochemistry, SAXS, reflectance spectroscopy, STM, XPS, SIMS, ESCA, X-ray topography and DOSY-NMR. This article presents a short review of the preparation and characterisation of thin films of nanocrystalline titanium dioxide and modified silicon as well as their application in solar cells, water treatment, water splitting, self cleaning fabrics, sensors, optoelectronic devices and lab on chip systems.
U2 - 10.1088/1757-899X/12/1/012017
DO - 10.1088/1757-899X/12/1/012017
M3 - Conference Paper
T3 - IOP Conference Series: Materials Science and Engineering
BT - 4th International Conference on Innovation in Thin Film Processing and Characterization, ITFPC 2009
PB - IOP Publishing
T2 - International Conference on Innovation in Thin Film Processing and Characterization (ITFPC) 2009
Y2 - 17 November 2009 through 20 November 2009
ER -