Nanostructured thin films as functional coatings

Manoj Ainikalkannath Lazar, Jalil Khajehpour Tadvani, Wing Tung, Lorena Lopez, Walid Daoud

    Research output: Chapter in Book/Report/Conference proceedingConference PaperResearchpeer-review

    8 Citations (Scopus)


    Nanostructured thin films is one of the highly exploiting research areas particularly in applications such as photovoltaics, photocatalysis and sensor technologies. Highly tuned thin films, in terms of thickness, crystallinity, porosity and optical properties, can be fabricated on different substrates using the sol-gel method, chemical solution deposition (CSD), electrochemical etching, along with other conventional methods such as chemical vapour deposition (CVD) and physical vapour deposition (PVD). The above mentioned properties of these films are usually characterised using surface analysis techniques such as XRD, SEM, TEM, AFM, ellipsometry, electrochemistry, SAXS, reflectance spectroscopy, STM, XPS, SIMS, ESCA, X-ray topography and DOSY-NMR. This article presents a short review of the preparation and characterisation of thin films of nanocrystalline titanium dioxide and modified silicon as well as their application in solar cells, water treatment, water splitting, self cleaning fabrics, sensors, optoelectronic devices and lab on chip systems.
    Original languageEnglish
    Title of host publication4th International Conference on Innovation in Thin Film Processing and Characterization, ITFPC 2009
    PublisherIOP Publishing
    Number of pages9
    Publication statusPublished - 2010
    EventInternational Conference on Innovation in Thin Film Processing and Characterization (ITFPC) 2009 - Nancy, France
    Duration: 17 Nov 200920 Nov 2009

    Publication series

    NameIOP Conference Series: Materials Science and Engineering
    PublisherIOP Publishing


    ConferenceInternational Conference on Innovation in Thin Film Processing and Characterization (ITFPC) 2009
    Abbreviated titleITFPC 2009

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