Monolayer pattern evolution via substrate strain-mediated spinodal decomposition

The production of nanoscale patterning of a chemisorbed organic monolayer using substrate strain-mediated spinodal decomposition was discussed. Investigations show the evolution of a ≈6 nm scale pattern of interwoven features with ejection of surface Au atoms. It was found that the surface dynamics was governed by a substrate strain-mediated spinodal decomposition mechanism. The results show that the strain-inducing Si-Au bond interactions could drive the pattern formation and the alkyl chains plays a negligible role.