Monitoring cuprous ion transport by scanning electrochemical microscopy during the course of copper electrodeposition

Anthony Peter O'Mullane, Aaron K Neufeld, Alan Maxwell Bond

Research output: Contribution to journalArticleResearchpeer-review

11 Citations (Scopus)
Original languageEnglish
Pages (from-to)538 - 541
Number of pages4
JournalJournal of the Electrochemical Society
Volume155
Issue number8
Publication statusPublished - 2008

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