Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

Jian Liu; Hongqiang Wang; Zu Peng Chen; Helmuth Moehwald; Sebastian Fiechter; Roel van de Krol; Liping Wen; Lei Jiang; Markus Antonietti

doi:10.1002/adma.201404543

Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

Jian Liu, Hongqiang Wang, Zu Peng Chen, Helmuth Moehwald, Sebastian Fiechter, Roel van de Krol, Liping Wen, Lei Jiang, Markus Antonietti

Research output: Contribution to journal › Article › Research › peer-review

193 Citations (Scopus)

Abstract

An “ink” (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures of the stamp onto the substrates via in situ “chemical vapor deposition”. A photocurrent density of 30.2 μA cm^–2 at 1.23 V_RHE is achieved for a film on a conductive substrate, which is so far the highest value for pure carbon nitride based photoelectrochemical devices. (Wiley Online Library)

Original language	English
Pages (from-to)	712-718
Number of pages	7
Journal	Advanced Materials
Volume	27
Issue number	4
DOIs	https://doi.org/10.1002/adma.201404543
Publication status	Published - 27 Jan 2015
Externally published	Yes

Access to Document

10.1002/adma.201404543

Cite this

@article{7b97b06fe18140f888ec4b5d563c8775,

title = "Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application",

abstract = "An “ink” (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures of the stamp onto the substrates via in situ “chemical vapor deposition”. A photocurrent density of 30.2 μA cm–2 at 1.23 VRHE is achieved for a film on a conductive substrate, which is so far the highest value for pure carbon nitride based photoelectrochemical devices. (Wiley Online Library)",

author = "Jian Liu and Hongqiang Wang and Chen, {Zu Peng} and Helmuth Moehwald and Sebastian Fiechter and {van de Krol}, Roel and Liping Wen and Lei Jiang and Markus Antonietti",

year = "2015",

month = jan,

day = "27",

doi = "10.1002/adma.201404543",

language = "English",

volume = "27",

pages = "712--718",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-VCH Verlag GmbH & Co. KGaA",

number = "4",

}

TY - JOUR

T1 - Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

AU - Liu, Jian

AU - Wang, Hongqiang

AU - Chen, Zu Peng

AU - Moehwald, Helmuth

AU - Fiechter, Sebastian

AU - van de Krol, Roel

AU - Wen, Liping

AU - Jiang, Lei

AU - Antonietti, Markus

PY - 2015/1/27

Y1 - 2015/1/27

N2 - An “ink” (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures of the stamp onto the substrates via in situ “chemical vapor deposition”. A photocurrent density of 30.2 μA cm–2 at 1.23 VRHE is achieved for a film on a conductive substrate, which is so far the highest value for pure carbon nitride based photoelectrochemical devices. (Wiley Online Library)

AB - An “ink” (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures of the stamp onto the substrates via in situ “chemical vapor deposition”. A photocurrent density of 30.2 μA cm–2 at 1.23 VRHE is achieved for a film on a conductive substrate, which is so far the highest value for pure carbon nitride based photoelectrochemical devices. (Wiley Online Library)

UR - http://www.scopus.com/inward/record.url?scp=84921459986&partnerID=8YFLogxK

U2 - 10.1002/adma.201404543

DO - 10.1002/adma.201404543

M3 - Article

SN - 0935-9648

VL - 27

SP - 712

EP - 718

JO - Advanced Materials

JF - Advanced Materials

IS - 4

ER -

Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

Abstract

Access to Document

Other files and links

Cite this