Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application

Jian Liu, Hongqiang Wang, Zu Peng Chen, Helmuth Moehwald, Sebastian Fiechter, Roel van de Krol, Liping Wen, Lei Jiang, Markus Antonietti

Research output: Contribution to journalArticleResearchpeer-review

135 Citations (Scopus)

Abstract

An “ink” (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures of the stamp onto the substrates via in situ “chemical vapor deposition”. A photocurrent density of 30.2 μA cm–2 ­­at 1.23 VRHE is achieved for a film on a conductive substrate, which is so far the highest value for pure carbon nitride based photoelectrochemical devices. (Wiley Online Library)
Original languageEnglish
Pages (from-to)712-718
Number of pages7
JournalAdvanced Materials
Volume27
Issue number4
DOIs
Publication statusPublished - 27 Jan 2015
Externally publishedYes

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