Mechanophotopatterning on a photoresponsive elastomer

Christopher J. Kloxin, Timothy F. Scott, Hee Young Park, Christopher N. Bowman

Research output: Contribution to journalArticleResearchpeer-review

85 Citations (Scopus)

Abstract

Photopatterning of a photoreversible covalent elastomeric network under mechanical strain, or mechanophotopatterning, provides a facile approach to fabricate complex topographical features using elementary irradiation schemes. A photoresponsive material is deformed in two dimensions and irradiated through a mask, resulting in a transparent material with topography that reflects the concentric rings of the mask.

Original languageEnglish
Pages (from-to)1977-1981
Number of pages5
JournalAdvanced Materials
Volume23
Issue number17
DOIs
Publication statusPublished - 3 May 2011
Externally publishedYes

Keywords

  • elastomers
  • mechanophotopatterning
  • photoresponsive materials
  • thiol-ene click

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