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MCVD planar substrates for UV-written waveguide devices

A. S. Webb, F. R. Mahamd Adikan, J. K. Sahu, R. J. Standish, C. B.E. Gawith, J. C. Gates, P. G.R. Smith, D. N. Payne

Research output: Contribution to journalArticleResearchpeer-review

Abstract

A method for fabricating planar silica substrates via modified chemical vapour deposition (MCVD) and a modified fibre drawing technique is presented. Long lengths of planar material are generated from a single substrate offering a potentially low-cost alternative to existing planar substrate deposition processes. Buried straight and splitting waveguide channels, as well as Bragg gratings, are inscribed in the planar material using direct UV-writing technology, and the results are reported.

Original languageEnglish
Pages (from-to)517-519
Number of pages3
JournalElectronics Letters
Volume43
Issue number9
DOIs
Publication statusPublished - 2007
Externally publishedYes

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