Abstract
A method for fabricating planar silica substrates via modified chemical vapour deposition (MCVD) and a modified fibre drawing technique is presented. Long lengths of planar material are generated from a single substrate offering a potentially low-cost alternative to existing planar substrate deposition processes. Buried straight and splitting waveguide channels, as well as Bragg gratings, are inscribed in the planar material using direct UV-writing technology, and the results are reported.
| Original language | English |
|---|---|
| Pages (from-to) | 517-519 |
| Number of pages | 3 |
| Journal | Electronics Letters |
| Volume | 43 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 2007 |
| Externally published | Yes |
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