Abstract
X-ray photoemission spectroscopy (XPS), low-energy electron diffraction (LEED), reflection-absorption infrared spectroscopy (RAIRS), and scanning tunneling microscopy (STM) have been used to characterize the discontinuous oxide films formed following exposure of gaseous H8S18O12 hydridosilsesquioxane clusters to Si(111)-7 × 7. Collectively, the four surface characterization techniques support a reaction involving cluster decomposition on the Si(111)-7 × 7 surface. The decomposition of H8S18O12 upon reaction with Si(111)-7 × 7 is in stark contrast with that of the reaction of H8S18O12 with Si(100)-2 × 1 in which the cluster cage remains intact.
Original language | English |
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Pages (from-to) | 6233-6241 |
Number of pages | 9 |
Journal | Langmuir |
Volume | 18 |
Issue number | 16 |
DOIs | |
Publication status | Published - 6 Aug 2002 |
Externally published | Yes |