The authors report a highly controlled approach, based on electron-beam lithography, to interconnect individual nano-objects for transport experiments. The process is based on a three-step procedure, consisting of fabrication of four alignment markers, localization of the nano-object after its immobilization onto functionalized surfaces, and interconnection of the single nanostructure by patterning two nanoelectrodes on its sides. The approach is highly reproducible and widely applicable and allows an alignment accuracy of 15-20 nm. Here they demonstrate the reliability of such technique by using a thin triangular gold nanoprism as the active element and show the I-V characteristics of the single nanostructure.
|Number of pages||4|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|Publication status||Published - 2006|