In situ monitoring of resistivity and carrier concentration during molecular beam epitaxy of topological insulator Bi2Se3

John Thery Hellerstedt, Jianhao -H Chen, Dohun Kim, William G Cullen, Changxi Zheng, Michael Fuhrer

    Research output: Chapter in Book/Report/Conference proceedingConference PaperResearchpeer-review

    3 Citations (Scopus)
    Original languageEnglish
    Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
    EditorsJames Friend, H Hoe Tan
    Place of PublicationBelingham USA
    PublisherSPIE
    Pages1 - 7
    Number of pages7
    DOIs
    Publication statusPublished - 2013
    EventConference on Micro/Nano Materials, Devices, and Systems 2013 - RMIT University, Melbourne, Australia
    Duration: 9 Dec 201311 Dec 2013

    Publication series

    NameSPIE - International Society for Optical Engineering. Proceedings
    PublisherSPIE
    Volume8923
    ISSN (Print)0277-786X
    ISSN (Electronic)1996-756X

    Conference

    ConferenceConference on Micro/Nano Materials, Devices, and Systems 2013
    Country/TerritoryAustralia
    CityMelbourne
    Period9/12/1311/12/13
    OtherProceedings of SPIE Vol. 8923

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