High spatial resolution STXM at 6.2 keV photon energy

Joan Vila-Comamala, Martin Dierolf, Cameron M. Kewish, Pierre Thibault, Tero Pilvi, Elina Färm, Vitaliy Guzenko, Sergey Gorelick, Andreas Menzel, Oliver Bunk, Mikko Ritala, Franz Pfeiffer, Christian David

Research output: Chapter in Book/Report/Conference proceedingConference PaperResearchpeer-review

8 Citations (Scopus)

Abstract

We report on a zone-doubling technique that bypasses the electron-beam lithography limitations for the production of X-ray diffractive optics and enables the fabrication of Fresnel zone plates with smaller outermost zone widths than other well-established approaches.We have applied this method to manufacture hard X-ray Fresnel zone plates with outermost zone widths of 25 and 20 nm. These lenses have been tested in scanning transmission X-ray microscopy (STXM) at energies up to 6.2 keV, producing images of test structures that demonstrate a spatial resolution of 25 nm. High spatial resolution STXM images of several biological specimens have been acquired in transmission, dark-field and differential phase contrast modes.

Original languageEnglish
Title of host publicationX-ray Optics and Microanalysis - Proceedings of the 20th International Congress, ICXOM20
Pages80-84
Number of pages5
Volume1221
DOIs
Publication statusPublished - 22 Oct 2010
Externally publishedYes
Event20th International Congress on X-ray Optics and Microanalysis, ICXOM20 - Karlsruhe, Germany
Duration: 15 Sep 200918 Sep 2009

Conference

Conference20th International Congress on X-ray Optics and Microanalysis, ICXOM20
CountryGermany
CityKarlsruhe
Period15/09/0918/09/09

Keywords

  • Atomic layer deposition
  • Electron-beam lithography
  • X-ray diffractive optics
  • X-ray microscopy

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