High spatial resolution STXM at 6.2 keV photon energy

Joan Vila-Comamala; Martin Dierolf; Cameron M. Kewish; Pierre Thibault; Tero Pilvi; Elina Färm; Vitaliy Guzenko; Sergey Gorelick; Andreas Menzel; Oliver Bunk; Mikko Ritala; Franz Pfeiffer; Christian David

doi:10.1063/1.3399261

High spatial resolution STXM at 6.2 keV photon energy

Joan Vila-Comamala, Martin Dierolf, Cameron M. Kewish, Pierre Thibault, Tero Pilvi, Elina Färm, Vitaliy Guzenko, Sergey Gorelick, Andreas Menzel, Oliver Bunk, Mikko Ritala, Franz Pfeiffer, Christian David

Research output: Chapter in Book/Report/Conference proceeding › Conference Paper › Research › peer-review

8 Citations (Scopus)

Abstract

We report on a zone-doubling technique that bypasses the electron-beam lithography limitations for the production of X-ray diffractive optics and enables the fabrication of Fresnel zone plates with smaller outermost zone widths than other well-established approaches.We have applied this method to manufacture hard X-ray Fresnel zone plates with outermost zone widths of 25 and 20 nm. These lenses have been tested in scanning transmission X-ray microscopy (STXM) at energies up to 6.2 keV, producing images of test structures that demonstrate a spatial resolution of 25 nm. High spatial resolution STXM images of several biological specimens have been acquired in transmission, dark-field and differential phase contrast modes.

Original language	English
Title of host publication	X-ray Optics and Microanalysis - Proceedings of the 20th International Congress, ICXOM20
Pages	80-84
Number of pages	5
Volume	1221
DOIs	https://doi.org/10.1063/1.3399261
Publication status	Published - 22 Oct 2010
Externally published	Yes
Event	20th International Congress on X-ray Optics and Microanalysis, ICXOM20 - Karlsruhe, Germany Duration: 15 Sep 2009 → 18 Sep 2009

Conference

Conference	20th International Congress on X-ray Optics and Microanalysis, ICXOM20
Country	Germany
City	Karlsruhe
Period	15/09/09 → 18/09/09

Keywords

Atomic layer deposition
Electron-beam lithography
X-ray diffractive optics
X-ray microscopy

Access to Document

10.1063/1.3399261

Link to publication in Scopus

Cite this

Vila-Comamala, J., Dierolf, M., Kewish, C. M., Thibault, P., Pilvi, T., Färm, E., Guzenko, V., Gorelick, S., Menzel, A., Bunk, O., Ritala, M., Pfeiffer, F., & David, C. (2010). High spatial resolution STXM at 6.2 keV photon energy. In X-ray Optics and Microanalysis - Proceedings of the 20th International Congress, ICXOM20 (Vol. 1221, pp. 80-84) https://doi.org/10.1063/1.3399261

Vila-Comamala, Joan ; Dierolf, Martin ; Kewish, Cameron M. ; Thibault, Pierre ; Pilvi, Tero ; Färm, Elina ; Guzenko, Vitaliy ; Gorelick, Sergey ; Menzel, Andreas ; Bunk, Oliver ; Ritala, Mikko ; Pfeiffer, Franz ; David, Christian. / High spatial resolution STXM at 6.2 keV photon energy. X-ray Optics and Microanalysis - Proceedings of the 20th International Congress, ICXOM20. Vol. 1221 2010. pp. 80-84

@inproceedings{d5d8ca314f9640c9ab860458347c0bc6,

title = "High spatial resolution STXM at 6.2 keV photon energy",

abstract = "We report on a zone-doubling technique that bypasses the electron-beam lithography limitations for the production of X-ray diffractive optics and enables the fabrication of Fresnel zone plates with smaller outermost zone widths than other well-established approaches.We have applied this method to manufacture hard X-ray Fresnel zone plates with outermost zone widths of 25 and 20 nm. These lenses have been tested in scanning transmission X-ray microscopy (STXM) at energies up to 6.2 keV, producing images of test structures that demonstrate a spatial resolution of 25 nm. High spatial resolution STXM images of several biological specimens have been acquired in transmission, dark-field and differential phase contrast modes.",

keywords = "Atomic layer deposition, Electron-beam lithography, X-ray diffractive optics, X-ray microscopy",

author = "Joan Vila-Comamala and Martin Dierolf and Kewish, {Cameron M.} and Pierre Thibault and Tero Pilvi and Elina F{\"a}rm and Vitaliy Guzenko and Sergey Gorelick and Andreas Menzel and Oliver Bunk and Mikko Ritala and Franz Pfeiffer and Christian David",

year = "2010",

month = oct,

day = "22",

doi = "10.1063/1.3399261",

language = "English",

isbn = "9780735407640",

volume = "1221",

pages = "80--84",

booktitle = "X-ray Optics and Microanalysis - Proceedings of the 20th International Congress, ICXOM20",

note = "20th International Congress on X-ray Optics and Microanalysis, ICXOM20 ; Conference date: 15-09-2009 Through 18-09-2009",

}

Vila-Comamala, J, Dierolf, M, Kewish, CM, Thibault, P, Pilvi, T, Färm, E, Guzenko, V, Gorelick, S, Menzel, A, Bunk, O, Ritala, M, Pfeiffer, F & David, C 2010, High spatial resolution STXM at 6.2 keV photon energy. in X-ray Optics and Microanalysis - Proceedings of the 20th International Congress, ICXOM20. vol. 1221, pp. 80-84, 20th International Congress on X-ray Optics and Microanalysis, ICXOM20, Karlsruhe, Germany, 15/09/09. https://doi.org/10.1063/1.3399261

High spatial resolution STXM at 6.2 keV photon energy. / Vila-Comamala, Joan; Dierolf, Martin; Kewish, Cameron M.; Thibault, Pierre; Pilvi, Tero; Färm, Elina; Guzenko, Vitaliy; Gorelick, Sergey; Menzel, Andreas; Bunk, Oliver; Ritala, Mikko; Pfeiffer, Franz; David, Christian.

X-ray Optics and Microanalysis - Proceedings of the 20th International Congress, ICXOM20. Vol. 1221 2010. p. 80-84.

Research output: Chapter in Book/Report/Conference proceeding › Conference Paper › Research › peer-review

TY - GEN

T1 - High spatial resolution STXM at 6.2 keV photon energy

AU - Vila-Comamala, Joan

AU - Dierolf, Martin

AU - Kewish, Cameron M.

AU - Thibault, Pierre

AU - Pilvi, Tero

AU - Färm, Elina

AU - Guzenko, Vitaliy

AU - Gorelick, Sergey

AU - Menzel, Andreas

AU - Bunk, Oliver

AU - Ritala, Mikko

AU - Pfeiffer, Franz

AU - David, Christian

PY - 2010/10/22

Y1 - 2010/10/22

N2 - We report on a zone-doubling technique that bypasses the electron-beam lithography limitations for the production of X-ray diffractive optics and enables the fabrication of Fresnel zone plates with smaller outermost zone widths than other well-established approaches.We have applied this method to manufacture hard X-ray Fresnel zone plates with outermost zone widths of 25 and 20 nm. These lenses have been tested in scanning transmission X-ray microscopy (STXM) at energies up to 6.2 keV, producing images of test structures that demonstrate a spatial resolution of 25 nm. High spatial resolution STXM images of several biological specimens have been acquired in transmission, dark-field and differential phase contrast modes.

AB - We report on a zone-doubling technique that bypasses the electron-beam lithography limitations for the production of X-ray diffractive optics and enables the fabrication of Fresnel zone plates with smaller outermost zone widths than other well-established approaches.We have applied this method to manufacture hard X-ray Fresnel zone plates with outermost zone widths of 25 and 20 nm. These lenses have been tested in scanning transmission X-ray microscopy (STXM) at energies up to 6.2 keV, producing images of test structures that demonstrate a spatial resolution of 25 nm. High spatial resolution STXM images of several biological specimens have been acquired in transmission, dark-field and differential phase contrast modes.

KW - Atomic layer deposition

KW - Electron-beam lithography

KW - X-ray diffractive optics

KW - X-ray microscopy

UR - http://www.scopus.com/inward/record.url?scp=77958017557&partnerID=8YFLogxK

U2 - 10.1063/1.3399261

DO - 10.1063/1.3399261

M3 - Conference Paper

AN - SCOPUS:77958017557

SN - 9780735407640

VL - 1221

SP - 80

EP - 84

BT - X-ray Optics and Microanalysis - Proceedings of the 20th International Congress, ICXOM20

T2 - 20th International Congress on X-ray Optics and Microanalysis, ICXOM20

Y2 - 15 September 2009 through 18 September 2009

ER -