High-efficiency fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating

Sergey Gorelick, Joan Vila-Comamala, Vitaliy A. Guzenko, Ray Barrett, Murielle Salomé, Christian David

Research output: Contribution to journalArticleResearchpeer-review

90 Citations (Scopus)


The fabrication and characterization of Fresnel zone plates (FZPs) for hard X-ray microscopy applications are reported. High-quality 500 nm- and 1 m-thick Au FZPs with outermost zone widths down to 50 nm and 70 nm, respectively, and with diameters up to 600 m were fabricated. The diffraction efficiencies of the fabricated FZPs were measured for a wide range of X-ray energies (2.8-13.2 keV) showing excellent values up to 65-75% of the theoretical values, reflecting the good quality of the FZPs. Spatially resolved diffraction efficiency measurements indicate the uniformity of the FZPs and a defect-free structure.

Original languageEnglish
Pages (from-to)442-446
Number of pages5
JournalJournal of Synchrotron Radiation
Issue number3
Publication statusPublished - 1 May 2011
Externally publishedYes


  • Au electroplating
  • electron-beam lithography
  • Fresnel zone plate
  • hard X-rays
  • PMMA
  • X-ray optics

Cite this