High aspect ratio nanostructuring by high energy electrons and electroplating

Sergey Gorelick, Joan Vila-Comamala, Vitaliy A. Guzenko, Christian David

Research output: Contribution to journalArticleResearchpeer-review

20 Citations (Scopus)

Abstract

Due to the ability of 100 keV electrons to penetrate deep into resist with little scattering, we were able to directly write various dense and high aspect ratio nanostructures in up to 1.65 μm thick layers of poly(methyl methacrylate) (PMMA) resist. The PMMA molds produced by electron beam lithography were developed using a high contrast developer. The molds were used to transfer the pattern into metallic nanostructures by filling the developed trenches with Au by electroplating. By exposing lines narrower than the target width, we observed improved process latitude and line width control. The obtained aspect ratios of the dense structures are nearly 17 in 1.1 μm PMMA layers and >13 for structures electroplated into these PMMA molds. The fabrication method was successfully applied to produce Au diffractive X-ray Fresnel zone plates of exceptionally good quality with 70 nm outermost zones using 1.1 μm thick PMMA mold. In addition, we also produced regular arrays of high aspect ratio and dense Au nanorods and high aspect ratio split ring resonators with line widths down to 65 nm and with heights up to 1.5 μm.

Original languageEnglish
Pages (from-to)2259-2262
Number of pages4
JournalMicroelectronic Engineering
Volume88
Issue number8
DOIs
Publication statusPublished - 1 Aug 2011
Externally publishedYes

Keywords

  • Au electroplating
  • Electron beam lithography
  • High aspect ratio
  • Nanorod
  • PMMA
  • Split-ring resonator
  • X-ray optics

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