Hierarchical ZnO nanorod electrodes: Effect of post annealing on structural and photoelectrochemical performance

Ijaz Ahmad Bhatti, T. A. Nirmal Peiris, Thomas D. Smith, K. G. Upul Wijayantha

Research output: Contribution to journalArticleResearchpeer-review

17 Citations (Scopus)


The effect of microwave and conventional annealing has been studied on ZnO nanorods grown on fluorine doped tin oxide (FTO) glass substrates by chemical bath deposition. XRD diffractograms revealed that there is a difference in the film crystallinity. FEG-SEM images of microwave irradiated ZnO nanorods indicate that microwave radiation caused sintering between individual rods and bundling them up thereby creating new rods with large diameter, without significantly affecting the hierarchical rod structures. It shows that internal surface area of treated films decreased compared to that of as-deposited film. The photoelectrochemical characteristics showed a decrease in the current density of the treated films compared to that of as-deposited film. The reduction of the photocurrent corresponding to conventional radiant annealed ZnO electrodes is more pronounce presumably due to deformation of rod structure and poor charge transport.

Original languageEnglish
Pages (from-to)333-336
Number of pages4
JournalMaterials Letters
Publication statusPublished - 7 Jan 2013
Externally publishedYes


  • Annealing
  • Microwave
  • Nanorods
  • Photoelectrochemical
  • ZnO

Cite this