Growth of carbon nanotubes on Si/SiO2 wafer etched by hydrofluoric acid under different etching durations

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@article{033284a166dd483c99a7377f1f644c0b,

title = "Growth of carbon nanotubes on Si/SiO2 wafer etched by hydrofluoric acid under different etching durations",

author = "Lling-Lling Tan and Siang-Piao Chai and Mohamed, \{Abdul Rahman\}",

year = "2012",

doi = "10.1016/j.apsusc.2012.02.092",

language = "English",

volume = "258",

pages = "5774 -- 5777",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier BV",

number = "15",

}

TY - JOUR

T1 - Growth of carbon nanotubes on Si/SiO2 wafer etched by hydrofluoric acid under different etching durations

AU - Tan, Lling-Lling

AU - Chai, Siang-Piao

AU - Mohamed, Abdul Rahman

PY - 2012

Y1 - 2012

UR - http://dx.doi.org/10.1016/j.apsusc.2012.02.092

UR - https://www.scopus.com/pages/publications/84859158633

U2 - 10.1016/j.apsusc.2012.02.092

DO - 10.1016/j.apsusc.2012.02.092

M3 - Article

SN - 0169-4332

VL - 258

SP - 5774

EP - 5777

JO - Applied Surface Science

JF - Applied Surface Science

IS - 15

ER -