Generation of a stable surface concentration of amino groups on silica coated onto titanium substrates by the plasma enhanced chemical vapour deposition method

Endre J. Szili, Sunil Kumar, Roger St C. Smart, Nicolas H. Voelcker

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20 Citations (Scopus)

Abstract

This report describes the amino functionalisation of the surface of plasma enhanced chemically vapour deposited silica films (PECVD-SiO 2 ), which were coated onto titanium substrates. Amino groups were linked to PECVD-SiO 2 via 3-aminpropyl triethoxysilane (APTES). We showed that the APTES functionalised PECVD-SiO 2 surfaces contained a high packing density of amino groups (67-92 NH 2 groups per nm 2 ), indicative of a multilayered and highly cross-linked APTES film. 65-66% of the original surface concentration of APTES was retained on the PECVD-SiO 2 surface after incubation under physiological conditions, indicating that APTES films are relatively stable on PECVD-SiO 2 in these environments. The stability of the amino groups obtained on PECVD-SiO 2 in this study is much higher compared to other hydroxyl-bearing materials, such as titanium. Therefore, PECVD-SiO 2 films may find use as functional biomaterial coatings and as intermediate adhesion layers in silanisation processes.

Original languageEnglish
Pages (from-to)6846-6850
Number of pages5
JournalApplied Surface Science
Volume255
Issue number15
DOIs
Publication statusPublished - 15 May 2009
Externally publishedYes

Keywords

  • 3-Aminopropyl triethoxysilane
  • Plasma enhanced chemical vapour deposition
  • Silica
  • Titanium

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