This report describes the amino functionalisation of the surface of plasma enhanced chemically vapour deposited silica films (PECVD-SiO 2 ), which were coated onto titanium substrates. Amino groups were linked to PECVD-SiO 2 via 3-aminpropyl triethoxysilane (APTES). We showed that the APTES functionalised PECVD-SiO 2 surfaces contained a high packing density of amino groups (67-92 NH 2 groups per nm 2 ), indicative of a multilayered and highly cross-linked APTES film. 65-66% of the original surface concentration of APTES was retained on the PECVD-SiO 2 surface after incubation under physiological conditions, indicating that APTES films are relatively stable on PECVD-SiO 2 in these environments. The stability of the amino groups obtained on PECVD-SiO 2 in this study is much higher compared to other hydroxyl-bearing materials, such as titanium. Therefore, PECVD-SiO 2 films may find use as functional biomaterial coatings and as intermediate adhesion layers in silanisation processes.
- 3-Aminopropyl triethoxysilane
- Plasma enhanced chemical vapour deposition