Fabrication of nanopillar crystalline ITO thin films with high transmittance and IR reflectance by RF magnetron sputtering

Ling Dong, Guisheng Zhu, Huarui Xu, Xupeng Jiang, Xiuyun Zhang, Yunyun Zhao, Dongliang Yan, Le Yuan, Aibing Yu

Research output: Contribution to journalArticleResearchpeer-review

Abstract

Nanopillar crystalline indium tin oxide (ITO) thin films were deposited on soda-lime glass substrates by radio frequency (RF) magnetron sputtering under the power levels of 100 W, 150 W, 200 W and 250 W. The preparation process of thin films is divided into two steps, firstly, sputtering a very thin and granular crystalline film at the bottom, and then sputtering a nanopillar crystalline film above the bottom film. The structure, morphology, optical and electrical properties of the nanopillar crystalline ITO thin films were investigated. From X-ray diffraction (XRD) analysis, the nanopillar crystalline thin films shows (400) preferred orientation. Due to the effect of the bottom granular grains, the crystallinity of the nanopillar crystals on the upper layer was greatly improved. The nanopillar crystalline ITO thin films exhibited excellent electrical properties, enhanced visible light transmittance and a highly infrared reflectivity in the mid-infrared region. It is noted that the thin film deposited at 200 W showed the best combination of optical and electrical performance, with resistivity of 1.44 × 10-4 Ω cm, average transmittance of 88.49% (with a film thickness of 1031 nm) and IR reflectivity reaching 89.18%.

Original languageEnglish
Article number958
Number of pages11
JournalMaterials
Volume16
Issue number6
DOIs
Publication statusPublished - 1 Mar 2019

Keywords

  • Indium tin oxide thin film
  • IR reflectance
  • Nanopillar crystalline
  • RF magnetron sputtering
  • Transmittance

Cite this

Dong, Ling ; Zhu, Guisheng ; Xu, Huarui ; Jiang, Xupeng ; Zhang, Xiuyun ; Zhao, Yunyun ; Yan, Dongliang ; Yuan, Le ; Yu, Aibing. / Fabrication of nanopillar crystalline ITO thin films with high transmittance and IR reflectance by RF magnetron sputtering. In: Materials. 2019 ; Vol. 16, No. 6.
@article{ecfa99cd4fd047519129694f34aed7e9,
title = "Fabrication of nanopillar crystalline ITO thin films with high transmittance and IR reflectance by RF magnetron sputtering",
abstract = "Nanopillar crystalline indium tin oxide (ITO) thin films were deposited on soda-lime glass substrates by radio frequency (RF) magnetron sputtering under the power levels of 100 W, 150 W, 200 W and 250 W. The preparation process of thin films is divided into two steps, firstly, sputtering a very thin and granular crystalline film at the bottom, and then sputtering a nanopillar crystalline film above the bottom film. The structure, morphology, optical and electrical properties of the nanopillar crystalline ITO thin films were investigated. From X-ray diffraction (XRD) analysis, the nanopillar crystalline thin films shows (400) preferred orientation. Due to the effect of the bottom granular grains, the crystallinity of the nanopillar crystals on the upper layer was greatly improved. The nanopillar crystalline ITO thin films exhibited excellent electrical properties, enhanced visible light transmittance and a highly infrared reflectivity in the mid-infrared region. It is noted that the thin film deposited at 200 W showed the best combination of optical and electrical performance, with resistivity of 1.44 × 10-4 Ω cm, average transmittance of 88.49{\%} (with a film thickness of 1031 nm) and IR reflectivity reaching 89.18{\%}.",
keywords = "Indium tin oxide thin film, IR reflectance, Nanopillar crystalline, RF magnetron sputtering, Transmittance",
author = "Ling Dong and Guisheng Zhu and Huarui Xu and Xupeng Jiang and Xiuyun Zhang and Yunyun Zhao and Dongliang Yan and Le Yuan and Aibing Yu",
year = "2019",
month = "3",
day = "1",
doi = "10.3390/ma12060958",
language = "English",
volume = "16",
journal = "Materials",
issn = "1996-1944",
publisher = "MDPI",
number = "6",

}

Fabrication of nanopillar crystalline ITO thin films with high transmittance and IR reflectance by RF magnetron sputtering. / Dong, Ling; Zhu, Guisheng; Xu, Huarui; Jiang, Xupeng; Zhang, Xiuyun; Zhao, Yunyun; Yan, Dongliang; Yuan, Le; Yu, Aibing.

In: Materials, Vol. 16, No. 6, 958, 01.03.2019.

Research output: Contribution to journalArticleResearchpeer-review

TY - JOUR

T1 - Fabrication of nanopillar crystalline ITO thin films with high transmittance and IR reflectance by RF magnetron sputtering

AU - Dong, Ling

AU - Zhu, Guisheng

AU - Xu, Huarui

AU - Jiang, Xupeng

AU - Zhang, Xiuyun

AU - Zhao, Yunyun

AU - Yan, Dongliang

AU - Yuan, Le

AU - Yu, Aibing

PY - 2019/3/1

Y1 - 2019/3/1

N2 - Nanopillar crystalline indium tin oxide (ITO) thin films were deposited on soda-lime glass substrates by radio frequency (RF) magnetron sputtering under the power levels of 100 W, 150 W, 200 W and 250 W. The preparation process of thin films is divided into two steps, firstly, sputtering a very thin and granular crystalline film at the bottom, and then sputtering a nanopillar crystalline film above the bottom film. The structure, morphology, optical and electrical properties of the nanopillar crystalline ITO thin films were investigated. From X-ray diffraction (XRD) analysis, the nanopillar crystalline thin films shows (400) preferred orientation. Due to the effect of the bottom granular grains, the crystallinity of the nanopillar crystals on the upper layer was greatly improved. The nanopillar crystalline ITO thin films exhibited excellent electrical properties, enhanced visible light transmittance and a highly infrared reflectivity in the mid-infrared region. It is noted that the thin film deposited at 200 W showed the best combination of optical and electrical performance, with resistivity of 1.44 × 10-4 Ω cm, average transmittance of 88.49% (with a film thickness of 1031 nm) and IR reflectivity reaching 89.18%.

AB - Nanopillar crystalline indium tin oxide (ITO) thin films were deposited on soda-lime glass substrates by radio frequency (RF) magnetron sputtering under the power levels of 100 W, 150 W, 200 W and 250 W. The preparation process of thin films is divided into two steps, firstly, sputtering a very thin and granular crystalline film at the bottom, and then sputtering a nanopillar crystalline film above the bottom film. The structure, morphology, optical and electrical properties of the nanopillar crystalline ITO thin films were investigated. From X-ray diffraction (XRD) analysis, the nanopillar crystalline thin films shows (400) preferred orientation. Due to the effect of the bottom granular grains, the crystallinity of the nanopillar crystals on the upper layer was greatly improved. The nanopillar crystalline ITO thin films exhibited excellent electrical properties, enhanced visible light transmittance and a highly infrared reflectivity in the mid-infrared region. It is noted that the thin film deposited at 200 W showed the best combination of optical and electrical performance, with resistivity of 1.44 × 10-4 Ω cm, average transmittance of 88.49% (with a film thickness of 1031 nm) and IR reflectivity reaching 89.18%.

KW - Indium tin oxide thin film

KW - IR reflectance

KW - Nanopillar crystalline

KW - RF magnetron sputtering

KW - Transmittance

UR - http://www.scopus.com/inward/record.url?scp=85063471216&partnerID=8YFLogxK

U2 - 10.3390/ma12060958

DO - 10.3390/ma12060958

M3 - Article

VL - 16

JO - Materials

JF - Materials

SN - 1996-1944

IS - 6

M1 - 958

ER -