Abstract
Nanopillar crystalline indium tin oxide (ITO) thin films were deposited on soda-lime glass substrates by radio frequency (RF) magnetron sputtering under the power levels of 100 W, 150 W, 200 W and 250 W. The preparation process of thin films is divided into two steps, firstly, sputtering a very thin and granular crystalline film at the bottom, and then sputtering a nanopillar crystalline film above the bottom film. The structure, morphology, optical and electrical properties of the nanopillar crystalline ITO thin films were investigated. From X-ray diffraction (XRD) analysis, the nanopillar crystalline thin films shows (400) preferred orientation. Due to the effect of the bottom granular grains, the crystallinity of the nanopillar crystals on the upper layer was greatly improved. The nanopillar crystalline ITO thin films exhibited excellent electrical properties, enhanced visible light transmittance and a highly infrared reflectivity in the mid-infrared region. It is noted that the thin film deposited at 200 W showed the best combination of optical and electrical performance, with resistivity of 1.44 × 10-4 Ω cm, average transmittance of 88.49% (with a film thickness of 1031 nm) and IR reflectivity reaching 89.18%.
| Original language | English |
|---|---|
| Article number | 958 |
| Number of pages | 11 |
| Journal | Materials |
| Volume | 16 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1 Mar 2019 |
Keywords
- Indium tin oxide thin film
- IR reflectance
- Nanopillar crystalline
- RF magnetron sputtering
- Transmittance
Cite this
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Fabrication of nanopillar crystalline ITO thin films with high transmittance and IR reflectance by RF magnetron sputtering. / Dong, Ling; Zhu, Guisheng; Xu, Huarui; Jiang, Xupeng; Zhang, Xiuyun; Zhao, Yunyun; Yan, Dongliang; Yuan, Le; Yu, Aibing.
In: Materials, Vol. 16, No. 6, 958, 01.03.2019.Research output: Contribution to journal › Article › Research › peer-review
TY - JOUR
T1 - Fabrication of nanopillar crystalline ITO thin films with high transmittance and IR reflectance by RF magnetron sputtering
AU - Dong, Ling
AU - Zhu, Guisheng
AU - Xu, Huarui
AU - Jiang, Xupeng
AU - Zhang, Xiuyun
AU - Zhao, Yunyun
AU - Yan, Dongliang
AU - Yuan, Le
AU - Yu, Aibing
PY - 2019/3/1
Y1 - 2019/3/1
N2 - Nanopillar crystalline indium tin oxide (ITO) thin films were deposited on soda-lime glass substrates by radio frequency (RF) magnetron sputtering under the power levels of 100 W, 150 W, 200 W and 250 W. The preparation process of thin films is divided into two steps, firstly, sputtering a very thin and granular crystalline film at the bottom, and then sputtering a nanopillar crystalline film above the bottom film. The structure, morphology, optical and electrical properties of the nanopillar crystalline ITO thin films were investigated. From X-ray diffraction (XRD) analysis, the nanopillar crystalline thin films shows (400) preferred orientation. Due to the effect of the bottom granular grains, the crystallinity of the nanopillar crystals on the upper layer was greatly improved. The nanopillar crystalline ITO thin films exhibited excellent electrical properties, enhanced visible light transmittance and a highly infrared reflectivity in the mid-infrared region. It is noted that the thin film deposited at 200 W showed the best combination of optical and electrical performance, with resistivity of 1.44 × 10-4 Ω cm, average transmittance of 88.49% (with a film thickness of 1031 nm) and IR reflectivity reaching 89.18%.
AB - Nanopillar crystalline indium tin oxide (ITO) thin films were deposited on soda-lime glass substrates by radio frequency (RF) magnetron sputtering under the power levels of 100 W, 150 W, 200 W and 250 W. The preparation process of thin films is divided into two steps, firstly, sputtering a very thin and granular crystalline film at the bottom, and then sputtering a nanopillar crystalline film above the bottom film. The structure, morphology, optical and electrical properties of the nanopillar crystalline ITO thin films were investigated. From X-ray diffraction (XRD) analysis, the nanopillar crystalline thin films shows (400) preferred orientation. Due to the effect of the bottom granular grains, the crystallinity of the nanopillar crystals on the upper layer was greatly improved. The nanopillar crystalline ITO thin films exhibited excellent electrical properties, enhanced visible light transmittance and a highly infrared reflectivity in the mid-infrared region. It is noted that the thin film deposited at 200 W showed the best combination of optical and electrical performance, with resistivity of 1.44 × 10-4 Ω cm, average transmittance of 88.49% (with a film thickness of 1031 nm) and IR reflectivity reaching 89.18%.
KW - Indium tin oxide thin film
KW - IR reflectance
KW - Nanopillar crystalline
KW - RF magnetron sputtering
KW - Transmittance
UR - http://www.scopus.com/inward/record.url?scp=85063471216&partnerID=8YFLogxK
U2 - 10.3390/ma12060958
DO - 10.3390/ma12060958
M3 - Article
VL - 16
JO - Materials
JF - Materials
SN - 1996-1944
IS - 6
M1 - 958
ER -