Efficient E-beam lithography exposure strategies for diffractive X-ray optics

V. A. Guzenko, J. Romijn, J. Vila-Comamala, S. Gorelick, C. David

Research output: Chapter in Book/Report/Conference proceedingConference PaperResearchpeer-review

8 Citations (Scopus)

Abstract

Exposure of structures with rotational symmetry by means of electron beam lithography is not trivial, because the e-beam writers are usually designed to deal with the data defined in Cartesian coordinates. Fabrication of circular nanostructures like Fresnel zone plates (FZPs) for x-ray microscopy applications requires exposures with resolution well below 1 nm. Therefore, special attention has to be paid to the efficient exposure data preparation, which will guarantee required precision and allow keeping the exposure time low. In this article, we describe in detail an optimized strategy that was applied for exposure of FZPs by the Vistec EBPG5000Plus e-beam lithography tool. Direct programming of exposure files allowed us to use fully the capabilities of this e-beam writer to expose efficiently and reproducibly FZPs with desired characteristics in both positive and negative tone resists.

Original languageEnglish
Title of host publication10th International Conference on X-Ray Microscopy
Pages92-95
Number of pages4
Volume1365
DOIs
Publication statusPublished - 1 Dec 2010
Externally publishedYes
EventInternational Conference on X-ray Microscopy (XRM) 2010 - Chicago, United States of America
Duration: 15 Aug 201020 Aug 2010
Conference number: 10th

Conference

ConferenceInternational Conference on X-ray Microscopy (XRM) 2010
CountryUnited States of America
CityChicago
Period15/08/1020/08/10

Keywords

  • electron beam lithography
  • Fresnel zone plate
  • HSQ
  • PMMA
  • x-ray microscopy

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