Effect of target density on microstructural, electrical, and optical properties of indium tin oxide thin films

Guisheng Zhu, Li Zhi, Huijuan Yang, Huarui Xu, Aibing Yu

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10 Citations (Scopus)

Abstract

In this paper, indium tin oxide (ITO) targets with different densities were used to deposit ITO thin films. The thin films were deposited from these targets at room temperature and annealed at 750?C. Microstructural, electrical, and optical properties of the as-prepared films were studied. It was found that the target density had no effect on the properties or deposition rate of radiofrequency (RF)-sputtered ITO thin films, different from the findings for direct current (DC)-sputtered films. Therefore, when using RF sputtering, the target does not require a high density and may be reused.
Original languageEnglish
Pages (from-to)2376 - 2379
Number of pages4
JournalJournal of Electronic Materials
Volume41
Issue number9
DOIs
Publication statusPublished - 2012
Externally publishedYes

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