TY - JOUR
T1 - Effect of target density on microstructural, electrical, and optical properties of indium tin oxide thin films
AU - Zhu, Guisheng
AU - Zhi, Li
AU - Yang, Huijuan
AU - Xu, Huarui
AU - Yu, Aibing
PY - 2012
Y1 - 2012
N2 - In this paper, indium tin oxide (ITO) targets with different densities were used to deposit ITO thin films. The thin films were deposited from these targets at room temperature and annealed at 750?C. Microstructural, electrical, and optical properties of the as-prepared films were studied. It was found that the target density had no effect on the properties or deposition rate of radiofrequency (RF)-sputtered ITO thin films, different from the findings for direct current (DC)-sputtered films. Therefore, when using RF sputtering, the target does not require a high density and may be reused.
AB - In this paper, indium tin oxide (ITO) targets with different densities were used to deposit ITO thin films. The thin films were deposited from these targets at room temperature and annealed at 750?C. Microstructural, electrical, and optical properties of the as-prepared films were studied. It was found that the target density had no effect on the properties or deposition rate of radiofrequency (RF)-sputtered ITO thin films, different from the findings for direct current (DC)-sputtered films. Therefore, when using RF sputtering, the target does not require a high density and may be reused.
UR - http://goo.gl/65GB1y
U2 - 10.1007/s11664-012-2155-x
DO - 10.1007/s11664-012-2155-x
M3 - Article
SN - 0361-5235
VL - 41
SP - 2376
EP - 2379
JO - Journal of Electronic Materials
JF - Journal of Electronic Materials
IS - 9
ER -