Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

Sergey Gorelick; Joan Vila-Comamala; Vitaliy Guzenko; Rajmund Mokso; Marco Stampanoni; Christian David

doi:10.1016/j.mee.2009.11.091

Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

Sergey Gorelick, Joan Vila-Comamala, Vitaliy Guzenko, Rajmund Mokso, Marco Stampanoni, Christian David

Research output: Contribution to journal › Article › Research › peer-review

31 Citations (Scopus)

Abstract

We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in ∼1 μm thick layers of PMMA. This method was successfully applied to produce various X-ray optics devices, such as beam shaping condensers, Fresnel zone plates and diffraction gratings. The performance of a beam shaper was tested at 10 keV photon energy showing a good diffraction efficiency of 10%.

Original language	English
Pages (from-to)	1052-1056
Number of pages	5
Journal	Microelectronic Engineering
Volume	87
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2009.11.091
Publication status	Published - 1 May 2010
Externally published	Yes

Keywords

Au electroplating
Electron beam lithography
Hard X-rays
High aspect ratio
PMMA
X-ray optics

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10.1016/j.mee.2009.11.091

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title = "Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication",

abstract = "We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in ∼1 μm thick layers of PMMA. This method was successfully applied to produce various X-ray optics devices, such as beam shaping condensers, Fresnel zone plates and diffraction gratings. The performance of a beam shaper was tested at 10 keV photon energy showing a good diffraction efficiency of 10\%.",

keywords = "Au electroplating, Electron beam lithography, Hard X-rays, High aspect ratio, PMMA, X-ray optics",

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TY - JOUR

T1 - Direct e-beam writing of high aspect ratio nanostructures in PMMA

T2 - A tool for diffractive X-ray optics fabrication

AU - Gorelick, Sergey

AU - Vila-Comamala, Joan

AU - Guzenko, Vitaliy

AU - Mokso, Rajmund

AU - Stampanoni, Marco

AU - David, Christian

PY - 2010/5/1

Y1 - 2010/5/1

N2 - We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in ∼1 μm thick layers of PMMA. This method was successfully applied to produce various X-ray optics devices, such as beam shaping condensers, Fresnel zone plates and diffraction gratings. The performance of a beam shaper was tested at 10 keV photon energy showing a good diffraction efficiency of 10%.

AB - We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in ∼1 μm thick layers of PMMA. This method was successfully applied to produce various X-ray optics devices, such as beam shaping condensers, Fresnel zone plates and diffraction gratings. The performance of a beam shaper was tested at 10 keV photon energy showing a good diffraction efficiency of 10%.

KW - Au electroplating

KW - Electron beam lithography

KW - Hard X-rays

KW - High aspect ratio

KW - PMMA

KW - X-ray optics

UR - https://www.scopus.com/pages/publications/76949084128

U2 - 10.1016/j.mee.2009.11.091

DO - 10.1016/j.mee.2009.11.091

M3 - Article

AN - SCOPUS:76949084128

SN - 0167-9317

VL - 87

SP - 1052

EP - 1056

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-8

ER -

Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

Abstract

Keywords

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