Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

Sergey Gorelick; Joan Vila-Comamala; Vitaliy Guzenko; Rajmund Mokso; Marco Stampanoni; Christian David

doi:10.1016/j.mee.2009.11.091

Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

Sergey Gorelick, Joan Vila-Comamala, Vitaliy Guzenko, Rajmund Mokso, Marco Stampanoni, Christian David

Research output: Contribution to journal › Article › Research › peer-review

29 Citations (Scopus)

Abstract

We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in ∼1 μm thick layers of PMMA. This method was successfully applied to produce various X-ray optics devices, such as beam shaping condensers, Fresnel zone plates and diffraction gratings. The performance of a beam shaper was tested at 10 keV photon energy showing a good diffraction efficiency of 10%.

Original language	English
Pages (from-to)	1052-1056
Number of pages	5
Journal	Microelectronic Engineering
Volume	87
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2009.11.091
Publication status	Published - 1 May 2010
Externally published	Yes

Keywords

Au electroplating
Electron beam lithography
Hard X-rays
High aspect ratio
PMMA
X-ray optics

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10.1016/j.mee.2009.11.091

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abstract = "We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in ∼1 μm thick layers of PMMA. This method was successfully applied to produce various X-ray optics devices, such as beam shaping condensers, Fresnel zone plates and diffraction gratings. The performance of a beam shaper was tested at 10 keV photon energy showing a good diffraction efficiency of 10%.",

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AU - Guzenko, Vitaliy

AU - Mokso, Rajmund

AU - Stampanoni, Marco

AU - David, Christian

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AB - We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in ∼1 μm thick layers of PMMA. This method was successfully applied to produce various X-ray optics devices, such as beam shaping condensers, Fresnel zone plates and diffraction gratings. The performance of a beam shaper was tested at 10 keV photon energy showing a good diffraction efficiency of 10%.

KW - Au electroplating

KW - Electron beam lithography

KW - Hard X-rays

KW - High aspect ratio

KW - PMMA

KW - X-ray optics

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Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

Abstract

Keywords

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