Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication

Sergey Gorelick, Joan Vila-Comamala, Vitaliy Guzenko, Rajmund Mokso, Marco Stampanoni, Christian David

Research output: Contribution to journalArticleResearchpeer-review

23 Citations (Scopus)

Abstract

We present a fast and reliable fabrication method of dense, periodic and high aspect ratio PMMA and metallic nanostructures. Biased lines are directly exposed by a 100 keV electron beam in thick layers of polymethyl-methacrylate (PMMA) resist to produce polymer mold which is later used to grow Au high aspect ratio structures by electroplating. Dense PMMA and Au nanostructures with aspect ratios >11 were manufactured in 520 nm and with aspect ratios >12 in ∼1 μm thick layers of PMMA. This method was successfully applied to produce various X-ray optics devices, such as beam shaping condensers, Fresnel zone plates and diffraction gratings. The performance of a beam shaper was tested at 10 keV photon energy showing a good diffraction efficiency of 10%.

Original languageEnglish
Pages (from-to)1052-1056
Number of pages5
JournalMicroelectronic Engineering
Volume87
Issue number5-8
DOIs
Publication statusPublished - 1 May 2010
Externally publishedYes

Keywords

  • Au electroplating
  • Electron beam lithography
  • Hard X-rays
  • High aspect ratio
  • PMMA
  • X-ray optics

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