Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating

Sergey Gorelick, Vitaliy A. Guzenko, Joan Vila-Comamala, Christian David

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Due to the ability of 100keV electrons to penetrate deep into resist with little scattering, we were able to directly write various dense and high aspect ratio nanostructures in 540nm and 1.1 νm thick layers of poly(methyl methacrylate) (PMMA) resist. The PMMA molds produced by electron beam lithography were developed using a high contrast developer. The molds were used to transfer the pattern into metallic nanostructures by filling the developed trenches with Au by electroplating. By exposing lines narrower than the target width, we observed improved process latitude and line width control. The obtained aspect ratios of the dense structures are nearly 20 in 1.1 νm PMMA layers and > 16 for structures electroplated into this PMMA mold. The fabrication method was successfully applied to produce Au diffractive x-ray Fresnel zone plates of exceptionally good quality with 50 and 70nm outermost zones using 540nm and 1.1 νm thick PMMA molds. In addition, we also produced regular arrays of high aspect ratio and dense Au nanorods with periods down to 100nm and high aspect ratio split-ring resonators.

Original languageEnglish
Article number295303
Issue number29
Publication statusPublished - 14 Jul 2010
Externally publishedYes

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