Abstract
This paper presents the development of a methodology for laser interferometry based pose measurement of a three degree of freedom (DOF) planar nanopositioning stage, and its use for tracking control over a large workspace. The proposed methodology employs a miniature pure rotation scanner mounted atop the stage's end effector to provide compensation for any sensor misalignment introduced through motion of the yaw axis, thereby reducing the impact of geometric errors. A feedforward-feedback compound controller is established for both the misalignment compensation and tracking aspects of operation, and experimentation is performed which demonstrates high precision positioning. Sensor positioning considerations are shown to have a crucial impact on tracking performance.
| Original language | English |
|---|---|
| Title of host publication | 2016 IEEE International Conference on Advanced Intelligent Mechatronics (AIM 2016) |
| Subtitle of host publication | Banff, Alberta, Canada, 12-15 July 2016 |
| Place of Publication | Piscataway, NJ |
| Publisher | IEEE, Institute of Electrical and Electronics Engineers |
| Pages | 1527-1532 |
| Number of pages | 6 |
| ISBN (Electronic) | 9781509020652 |
| ISBN (Print) | 9781509020669 |
| DOIs | |
| Publication status | Published - 26 Sept 2016 |
| Event | IEEE/ASME International Conference on Advanced Intelligent Mechatronics 2016 - Banff, Canada Duration: 12 Jul 2016 → 15 Jul 2016 Conference number: 15th http://ieeexplore.ieee.org/xpl/mostRecentIssue.jsp?punumber=7568655 (Proceedings) |
Conference
| Conference | IEEE/ASME International Conference on Advanced Intelligent Mechatronics 2016 |
|---|---|
| Abbreviated title | AIM 2016 |
| Country/Territory | Canada |
| City | Banff |
| Period | 12/07/16 → 15/07/16 |
| Internet address |
Equipment
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Melbourne Centre for Nanofabrication (MCN)
Langelier, S. (Manager)
Office of the Vice-Provost (Research and Research Infrastructure)Facility/equipment: Facility