TY - JOUR
T1 - Design of a microplasma device for spatially localised plasma polymerisation
AU - Al-Bataineh, Sameer A.
AU - Szili, Endre J.
AU - Mishra, Apurva
AU - Park, Sung Jin
AU - Eden, J. Gary
AU - Griesser, Hans J.
AU - Voelcker, Nicolas H.
AU - Short, Robert D.
AU - Steele, David A.
PY - 2011/8/23
Y1 - 2011/8/23
N2 - There is considerable interest in the spatial control of plasma polymerisation such as to produce sub-millimetre features with high fidelity, versatility and reproducibility, for example, for arrays or writable specific patterns. This study reports the design of a microcavity plasma device and a method for its fabrication, with the device comprising a single cavity of ≈400 μm diameter. The device can be fabricated within a short time and at low cost in a standard laboratory, with no need for a clean room facility. The device is capable of multiple operations in plasma polymerisation mode. XPS imaging combined with small-spot ROI analysis showed localised thin film deposition of an acrylic acid plasma polymer with good retention of carboxylate groups from the monomer. The device can be configured with flexibility and addressed for plasma polymer writing of complex patterns.
AB - There is considerable interest in the spatial control of plasma polymerisation such as to produce sub-millimetre features with high fidelity, versatility and reproducibility, for example, for arrays or writable specific patterns. This study reports the design of a microcavity plasma device and a method for its fabrication, with the device comprising a single cavity of ≈400 μm diameter. The device can be fabricated within a short time and at low cost in a standard laboratory, with no need for a clean room facility. The device is capable of multiple operations in plasma polymerisation mode. XPS imaging combined with small-spot ROI analysis showed localised thin film deposition of an acrylic acid plasma polymer with good retention of carboxylate groups from the monomer. The device can be configured with flexibility and addressed for plasma polymer writing of complex patterns.
KW - acrylic acid
KW - atmospheric pressure glow discharges
KW - dielectric-barrier discharges
KW - microcavity plasma devices
KW - plasma polymerisation
UR - http://www.scopus.com/inward/record.url?scp=80051707477&partnerID=8YFLogxK
U2 - 10.1002/ppap.201000176
DO - 10.1002/ppap.201000176
M3 - Article
AN - SCOPUS:80051707477
SN - 1612-8850
VL - 8
SP - 695
EP - 700
JO - Plasma Processes and Polymers
JF - Plasma Processes and Polymers
IS - 8
ER -