Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100keV electron beam lithography

Joan Vila-Comamala, Sergey Gorelick, Vitaliy A. Guzenko, Elina Färm, Mikko Ritala, Christian David

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Abstract

We investigated the fabrication of dense, high aspect ratio hydrogen silsesquioxane (HSQ) nanostructures by 100keV electron beam lithography. The samples were developed using a high contrast developer and supercritically dried in carbon dioxide. Dense gratings with line widths down to 25nm were patterned in 500nm-thick resist layers and semi-dense gratings with line widths down to 10nm (40nm pitch) were patterned in 250nm-thick resist layers. The dense HSQ nanostructures were used as molds for gold electrodeposition, and the semi-dense HSQ gratings were iridium-coated by atomic layer deposition. We used these methods to produce Fresnel zone plates with extreme aspect ratio for scanning transmission x-ray microscopy that showed excellent performance at 1.0keV photon energy.

Original languageEnglish
Article number285305
JournalNanotechnology
Volume21
Issue number28
DOIs
Publication statusPublished - 6 Jul 2010
Externally publishedYes

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