Covalent attachment of chiral alkaloids onto silicon surfaces

H. Wang; H. L. Zhang; Y. Guo; F. Y. Qiao; Q. Y. Sun

doi:10.1016/j.cap.2006.11.007

Covalent attachment of chiral alkaloids onto silicon surfaces

H. Wang, H. L. Zhang, Y. Guo, F. Y. Qiao, Q. Y. Sun

Research output: Contribution to journal › Article › Research › peer-review

Abstract

In this work, we report the covalent attachment of a chiral molecule onto a hydrogen-terminated Si(Si-H) surface by using an extremely mild approach. Cinchonine, a chiral alkaloid was self-assembled onto a Si-H surface via a photochemistry method at room temperature. The self-assembled monolayers (SAMs) obtained were characterized by means of ellipsometry, XPS and wettability studies. The film formation kinetics was monitored by ellipsometry and XPS, which indicated that a full monolayer was formed within 15 h. Contact angle titration data revealed that the surface of cinchonine underwent a transition around pH 10.

Original language	English
Pages (from-to)	e19-e22
Number of pages	4
Journal	Current Applied Physics
Volume	7
Issue number	SUPPL.1
DOIs	https://doi.org/10.1016/j.cap.2006.11.007
Publication status	Published - Apr 2007
Externally published	Yes

Keywords

Alkaloids
Chirality
Self-assembled monolayers (SAMs)
Si-H surface

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10.1016/j.cap.2006.11.007

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title = "Covalent attachment of chiral alkaloids onto silicon surfaces",

abstract = "In this work, we report the covalent attachment of a chiral molecule onto a hydrogen-terminated Si(Si-H) surface by using an extremely mild approach. Cinchonine, a chiral alkaloid was self-assembled onto a Si-H surface via a photochemistry method at room temperature. The self-assembled monolayers (SAMs) obtained were characterized by means of ellipsometry, XPS and wettability studies. The film formation kinetics was monitored by ellipsometry and XPS, which indicated that a full monolayer was formed within 15 h. Contact angle titration data revealed that the surface of cinchonine underwent a transition around pH 10.",

keywords = "Alkaloids, Chirality, Self-assembled monolayers (SAMs), Si-H surface",

author = "H. Wang and Zhang, {H. L.} and Y. Guo and Qiao, {F. Y.} and Sun, {Q. Y.}",

year = "2007",

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T1 - Covalent attachment of chiral alkaloids onto silicon surfaces

AU - Wang, H.

AU - Zhang, H. L.

AU - Guo, Y.

AU - Qiao, F. Y.

AU - Sun, Q. Y.

PY - 2007/4

Y1 - 2007/4

N2 - In this work, we report the covalent attachment of a chiral molecule onto a hydrogen-terminated Si(Si-H) surface by using an extremely mild approach. Cinchonine, a chiral alkaloid was self-assembled onto a Si-H surface via a photochemistry method at room temperature. The self-assembled monolayers (SAMs) obtained were characterized by means of ellipsometry, XPS and wettability studies. The film formation kinetics was monitored by ellipsometry and XPS, which indicated that a full monolayer was formed within 15 h. Contact angle titration data revealed that the surface of cinchonine underwent a transition around pH 10.

AB - In this work, we report the covalent attachment of a chiral molecule onto a hydrogen-terminated Si(Si-H) surface by using an extremely mild approach. Cinchonine, a chiral alkaloid was self-assembled onto a Si-H surface via a photochemistry method at room temperature. The self-assembled monolayers (SAMs) obtained were characterized by means of ellipsometry, XPS and wettability studies. The film formation kinetics was monitored by ellipsometry and XPS, which indicated that a full monolayer was formed within 15 h. Contact angle titration data revealed that the surface of cinchonine underwent a transition around pH 10.

KW - Alkaloids

KW - Chirality

KW - Self-assembled monolayers (SAMs)

KW - Si-H surface

UR - http://www.scopus.com/inward/record.url?scp=33847148848&partnerID=8YFLogxK

U2 - 10.1016/j.cap.2006.11.007

DO - 10.1016/j.cap.2006.11.007

M3 - Article

AN - SCOPUS:33847148848

VL - 7

SP - e19-e22

JO - Current Applied Physics

JF - Current Applied Physics

SN - 1567-1739

IS - SUPPL.1

ER -

Covalent attachment of chiral alkaloids onto silicon surfaces

Abstract

Keywords

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