Control of pinholes in epitaxial CoSi2 layers on Si(111)

R. T. Tung, J. L. Batstone

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The growth of ultrathin (<50 Å thick) uniform CoSi2 layers at low temperatures (<450 °C) has been reported recently. Pinholes are formed in these silicide layers when the temperature is raised to above ∼550 °C. An important driving force for the generation of pinholes has been identified as a change of the surface structure from CoSi2-C, stable at low temperature, to the high-temperature stable CoSi2-S. Treatment of the surface of CoSi2 facilitates this transition and prevents the formation of pinholes. A few important parameters in the silicide reaction are shown to govern the morphology of the reacted CoSi2 layers.

Original languageEnglish
Pages (from-to)648-650
Number of pages3
JournalApplied Physics Letters
Issue number8
Publication statusPublished - 1 Dec 1988
Externally publishedYes

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