Chloroethane physisorbed on hydrogenated Si(111): A test system for the evaluation of core level XPS assignment rules at Si/SiO2 interfaces

F. R. McFeely, K. Z. Zhang, Mark M. Banaszak Holl

Research output: Contribution to journalConference articleOther

2 Citations (Scopus)

Abstract

We briefly review the controversy concerning the proper methodology for the assignment of soft x-ray photoemission Si 2p core levels at Si/SiO2 interfaces. Evidence for Second nearest neighbor effects in the photoemission spectra of analogous free molecules in the gas phase are surveyed for the purpose of placing this controversy within a wider context. Physisorption experiments have been performed to inquire whether the second nearest neighbor effects found in free molecules are in any way reduced in their magnitude owing to the proximity to the highly polarizable Si surface. No evidence for such a diminution have been found.

Original languageEnglish
Pages (from-to)15-20
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume446
Publication statusPublished - 1 Jan 1997
Externally publishedYes
EventProceedings of the 1996 MRS Fall Meeting - Boston, MA, USA
Duration: 2 Dec 19965 Dec 1996

Cite this