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Characterization of a 20-nm hard X-ray focus by ptychographic coherent diffractive imaging

  • Joan Vila-Comamala
  • , Ana Diaz
  • , Manuel Guizar-Sicairos
  • , Sergey Gorelick
  • , Vitaliy A. Guzenko
  • , Petri Karvinen
  • , Cameron M. Kewish
  • , Elina Färm
  • , Mikko Ritala
  • , Alexandre Mantion
  • , Oliver Bunk
  • , Andreas Menzel
  • , Christian David

Research output: Chapter in Book/Report/Conference proceedingConference PaperResearchpeer-review

Abstract

Recent advances in the fabrication of diffractive X-ray optics have boosted hard X-ray microscopy into spatial resolutions of 30 nm and below. Here, we demonstrate the fabrication of zone-doubled Fresnel zone plates for multi-keV photon energies (4-12 keV) with outermost zone widths down to 20 nm. However, the characterization of such elements is not straightforward using conventional methods such as knife edge scans on well-characterized test objects. To overcome this limitation, we have used ptychographic coherent diffractive imaging to characterize a 20 nm-wide X-ray focus produced by a zone-doubled Fresnel zone plate at a photon energy of 6.2 keV. An ordinary scanning transmission X-ray microscope was modified to acquire the ptychographic data from a strongly scattering test object. The ptychographic algorithms allowed for the reconstruction of the image of the test object as well as for the reconstruction of the focused hard X-ray beam waist, with high spatial resolution and dynamic range. This method yields a full description of the focusing performance of the Fresnel zone plate and we demonstrate the usefulness ptychographic coherent diffractive imaging for metrology and alignment of nanofocusing diffractive X-ray lenses.

Original languageEnglish
Title of host publicationAdvances in X-Ray/EUV Optics and Components VI
Volume8139
DOIs
Publication statusPublished - 19 Oct 2011
Externally publishedYes
EventAdvances in X-Ray/EUV Optics and Components VI - San Diego, CA, United States of America
Duration: 22 Aug 201124 Aug 2011

Conference

ConferenceAdvances in X-Ray/EUV Optics and Components VI
Country/TerritoryUnited States of America
CitySan Diego, CA
Period22/08/1124/08/11

Keywords

  • Diffractive X-ray Optics
  • Electron beam lithography
  • Ptychographic coherent diffractive imaging
  • X-ray imaging

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