Abstract
Atomic-resolution electron microscopes utilize high-power magnetic lenses to produce magnified images of the atomic details of matter. Doing so involves placing samples inside the magnetic objective lens, where magnetic fields of up to a few tesla are always exerted. This can largely alter, or even destroy, the magnetic and physical structures of interest. Here, we describe a newly developed magnetic objective lens system that realizes a magnetic field free environment at the sample position. Combined with a higher-order aberration corrector, we achieve direct, atom-resolved imaging with sub-Å spatial resolution with a residual magnetic field of less than 0.2 mT at the sample position. This capability enables direct atom-resolved imaging of magnetic materials such as silicon steels. Removing the need to subject samples to high magnetic field environments enables a new stage in atomic resolution electron microscopy that realizes direct, atomic-level observation of samples without unwanted high magnetic field effects.
| Original language | English |
|---|---|
| Article number | 2308 |
| Number of pages | 5 |
| Journal | Nature Communications |
| Volume | 10 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 1 Dec 2019 |
Projects
- 1 Finished
-
Nanoscale field mapping in functional materials
Findlay, S. (Primary Chief Investigator (PCI)), Morgan, M. (Chief Investigator (CI)), Paganin, D. (Chief Investigator (CI)), Petersen, T. (Chief Investigator (CI)) & Shibata, N. (Partner Investigator (PI))
ARC - Australian Research Council, Monash University, University of Tokyo
26/05/16 → 2/12/21
Project: Research
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