Atomic layer deposition-developed two-dimensional Α-MoO3 windows excellent hydrogen peroxide electrochemical sensing capabilities

Zihan Wei, Zhenyin Hai, Mohammad Karbalaei Akbari, Dongchen Qi, Kaijian Xing, Qing Zhao, Francis Verpoort, Jie Hu, Lachlan Hyde, Serge Zhuiykov

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31 Citations (Scopus)


Two-dimensional (2D) α-MoO3 nano-films with thickness of 4.9 nm were fabricated via atomic layer deposition (ALD) technique for the first time on the wafer scale and were subsequently annealed at 200 °C. The developed MoO3 nano-films were composed of flat nanoparticles with the average size of about 35 nm and possessed layered orthorhombic phase (α-MoO3). The electrochemical sensor based on these 2D α-MoO3 nano-films exhibited great sensitivity of 168.72 μA mM−1 cm−2 to hydrogen peroxide (H2O2) and presented extremely wide linear detection range of 0.4 μM–57.6 mM with the lowest detection limit of 0.076 μM at the signal to noise ratio of 3. Furthermore, due to extremely thin nature of 2D α-MoO3 nano-films ultra-fast response/recovery time of ∼2.0 s was achieved under the wide linear H2O2 detection range. Additionally, the sensor based on 2D α-MoO3 nano-films was also demonstrated great long-term stability, excellent selectivity and high reproducibility. The 2D α-MoO3 nano-films fabricated via ALD technique in this work represent a great opportunity for development of high-performance electrochemical sensors based on 2D transition metal oxides.

Original languageEnglish
Pages (from-to)334-344
Number of pages11
JournalSensors and Actuators B: Chemical
Publication statusPublished - 1 Jun 2018
Externally publishedYes


  • Atomic layer deposition
  • Electrochemical sensing
  • Hydrogen peroxide
  • α-MoO

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