Abstract
The effects of the capillary stresses during the drying of p+ -type porous silicon (PS) layers are reported. The cracking of the PS layers occurs for samples thicker than a critical thickness value hc. Taking into account the elastic properties of p + -type PS material, a simple model shows that hc varies as (1 - p)3 and 1/γ2LV, where p is the porosity and γLV is the surface tension of the drying liquid. A good agreement with experimental results is observed. This study leads also to a very easy and simple method which increases the hc value by a factor of about 25 when using pentane as the drying liquid (instead of water).
| Original language | English |
|---|---|
| Pages (from-to) | 219-222 |
| Number of pages | 4 |
| Journal | Thin Solid Films |
| Volume | 276 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - 15 Apr 1996 |
| Externally published | Yes |
Keywords
- Elastic properties
- Growth mechanism
- Silicon
- Stress